Wide band semi-specular mirror film incorporating nanovoided polymeric layer

ABSTRACT

Low loss, high reflectivity wide band mirror films provide a desired mix of specular reflection and diffuse reflection or scattering to provide semi-specular reflectivity. The mirror films generally include both a specularly reflective multilayer optical film (MOF) having a wide reflection band, and a scattering layer. In some cases a low refractive index TIR layer is sandwiched between the MOF and the scattering layer. In other cases the scattering layer contacts the MOF directly. In embodiments that include the TIR layer, the TIR layer preferably has a nanovoided morphology and includes a plurality of particles and a polymer binder. In embodiments wherein the scattering layer contacts the MOF directly, the scattering layer preferably also has a nanovoided morphology and includes a plurality of particles and a polymer binder.

FIELD OF THE INVENTION

This invention relates generally to optical films whose reflection andtransmission characteristics are determined in large part byconstructive and destructive interference of light reflected frominterfaces between microlayers within the film, with particularapplication to such films that have very high reflectivity and lowtransmission of light over an extended wavelength range. The inventionalso relates to associated articles, systems, and methods.

BACKGROUND

Multilayer optical films are known. Such films typically incorporate alarge number of very thin layers of different light transmissivematerials, the layers being referred to as microlayers because they arethin enough so that the reflection and transmission characteristics ofthe optical film are determined in large part by constructive anddestructive interference of light reflected from the layer interfaces.Depending on the amount of birefringence (if any) exhibited by theindividual microlayers, and the relative refractive index differencesfor adjacent microlayers, and also on other design characteristics, themultilayer optical films can be made to have reflection and transmissionproperties that may be characterized as a reflective polarizer in somecases, and as a mirror in other cases, for example.

Reflective polarizers composed of a plurality of microlayers whosein-plane refractive indices are selected to provide a substantialrefractive index mismatch between adjacent microlayers along an in-planeblock axis and a substantial refractive index match between adjacentmicrolayers along an in-plane pass axis, with a sufficient number oflayers to ensure high reflectivity for normally incident light polarizedalong one principal direction, referred to as the block axis, whilemaintaining low reflectivity and high transmission for normally incidentlight polarized along an orthogonal principal direction, referred to asthe pass axis, have been known for some time. See, e.g., U.S. Pat. No.3,610,729 (Rogers), U.S. Pat. No. 4,446,305 (Rogers et al.), and U.S.Pat. No. 5,486,949 (Schrenk et al.).

More recently, researchers from 3M Company have pointed out thesignificance of layer-to-layer refractive index characteristics of suchfilms along the direction perpendicular to the film, i.e. the z-axis,and shown how these characteristics play an important role in thereflectivity and transmission of the films at oblique angles ofincidence. See, e.g., U.S. Pat. No. 5,882,774 (Jonza et al.). Jonza etal. teach, among other things, how a z-axis mismatch in refractive indexbetween adjacent microlayers, more briefly termed the z-index mismatchor Δnz, can be tailored to allow the construction of multilayer stacksfor which the Brewster angle—the angle at which reflectance ofp-polarized light at an interface goes to zero—is very large or isnonexistent. This in turn allows for the construction of multilayermirrors and polarizers whose interfacial reflectivity for p-polarizedlight decreases slowly with increasing angle of incidence, or isindependent of angle of incidence, or increases with angle of incidenceaway from the normal direction. As a result, multilayer films havinghigh reflectivity for both s- and p-polarized light for any incidentdirection in the case of mirrors, and for the selected direction in thecase of polarizers, over a wide bandwidth, can be achieved.

Some multilayer optical films are designed for narrow band operation,i.e., over a narrow range of wavelengths, while others are designed foruse over a broad wavelength range such as substantially the entirevisible or photopic spectrum, or the visible or photopic wavelengthrange together with near infrared wavelengths, for example.

Some reflective films are designed to reflect light specularly, suchthat a collimated incident beam is reflected as a collimated orsubstantially collimated (e.g., having a full-width-at-half-maximumpower of no more than 1.0 degrees, or no more than 0.3 degrees)reflected beam. A conventional household or automotive mirror is anexample of a specularly reflective film. Other reflective films aredesigned to reflect light diffusely, such that a collimated incidentbeam is reflected into a large cone, such as an entire hemisphere, ofdifferent scattering directions—for example, the reflected light mayhave a full-width-at-half-maximum power of at least 15 degrees, or atleast 45 degrees). “Flat white” paint is an example of a diffuselyreflective film.

In some cases, it is desirable for a reflective film to provide amixture or suitable balance of specular reflection and diffusereflection. We refer to such films as “semi-specular” reflective films.One application for such a film may be an edge-lit optical cavity thatemits light over an extended area, which may be useable as a backlight,for example. Three such cavities are depicted in FIGS. 1a, 1b, and 1c .An edge-mounted light source may be mounted at the left end of eachcavity, but is omitted from the drawings for generality.

A pure specular reflector performs according to the optical rule that“the angle of reflection equals the angle of incidence.” This is seen inthe hollow cavity 116 a of FIG. 1a . There, front and back reflectors,112 a, 114 a are both purely specular. A small portion of an initiallylaunched oblique light ray 150 a is transmitted through the frontreflector 112 a, but the remainder is reflected at an equal angle to theback reflector 114 a, and reflected again at an equal angle to the frontreflector 112 a, and so on as illustrated. This arrangement providesmaximum lateral transport of the light across the cavity 116 a, sincethe recycled ray is unimpeded in its lateral transit of the cavity 116a. However, no angular mixing occurs in the cavity, since there is nomechanism to convert light propagating at a given incidence angle toother incidence angles.

A purely Lambertian (diffuse) reflector, on the other hand, redirectslight rays equally in all directions. This is seen in the hollow cavity116 b of FIG. 1b , where the front and back reflectors 112 b, 114 b areboth purely Lambertian. The same initially launched oblique light ray150 b is immediately scattered in all directions by the front reflector112 b, most of the scattered light being reflected back into the cavity116 b but some being transmitted through the front reflector 112 b. Someof the reflected light travels “forward” (generally to the right as seenin the figure), but an equal amount travels “backward” (generally to theleft). By forward scattering, we refer to the lateral or in-plane (in aplane parallel to the scattering surface in question) propagationcomponents of the reflected light. When repeated, this process greatlydiminishes the forward-directed component of a light ray after severalreflections. The beam is rapidly dispersed, producing minimal lateraltransport.

A semi-specular reflector provides a balance of specular and diffusiveproperties. In the hollow cavity 116 c of FIG. 1c , the front reflector112 c is purely specular but the back reflector 114 c is semi-specular.The reflected portion of the same initially launched oblique light ray150 c strikes the back reflector 114 c, and is substantiallyforward-scattered in a controlled amount. The reflected cone of light isthen partially transmitted but mostly reflected (specularly) back to theback reflector 114 c, all while still propagating to a great extent inthe “forward” direction.

Semi-specular reflectors can thus be seen to promote the lateralspreading of light across the recycling cavity, while still providingadequate mixing of light ray directions and polarization. Reflectorsthat are partially diffuse but that have a substantially forwarddirected component may thus transport more light across a greaterdistance with fewer total reflections of the light rays. Reference ismade to PCT publication WO 2008/144644 (Weber et al.).

Certain design challenges arise when combining a diffusing layer with anMOF. Reference in this regard is made to PCT publication WO 2007/115040(Weber), “Wide Angle Mirror System”. The design challenges stem from theMOF effectively being optically immersed in a medium of refractive indexgreater than air, such that light scattered at highly oblique angles bythe scattering layer can propagate through the microlayers of the MOF atangles (“supercritical” angles) that are more oblique than the criticalangle for the MOF when immersed in air. This effect, combined with thefact that the reflection band of the MOF shifts to shorter wavelengthsas the propagation angle increases, and the fact that the spectral widthof the reflection band is limited by the number of optical repeat units(ORUs) of microlayers used in the MOF, can result in some of thescattered light, particularly at longer wavelengths, propagating all theway through the MOF to the back or rear major surface thereof. Any dirtor other disturbances such as absorbing materials that are present onsuch back major surface may cause that light to be absorbed or otherwiselost, detracting from the total reflectivity of the construction. Somesolutions to these design challenges are discussed in the '040 PCTpublication. However, additional solutions would be of benefit tooptical system manufacturers and designers.

BRIEF SUMMARY

We have found that semi-specular reflective mirror films can be used toprovide highly efficient light guides that may evenly distribute lightacross a backlight area or display area even in cases where the lightsource is located at one end or edge of the device, e.g., in the case ofa backlight or other extended-area light source that uses one or moreedge-mounted LED light sources. The semi-specular mirror films describedfurther herein may find utility in a variety of applications, such asenergy efficient display devices that use fewer and brighter LEDsources, and/or direct-lit fluorescent or LED lighting devices havinghigh efficiency and/or high spatially uniformity, and/or transflectivedisplays designed for use in daylight with little or no supplementallighting provided by edge-mounted or panel-mounted light sources. Otherpotential applications include the use of the semi-specular mirror filmsin room lighting, recessed lighting, desk lamps, edge light reflectors,light pipes, decorative lighting devices, displays used for signageapplications such as advertisement displays cases, lighting devices fortemperature controlled displays, thermally molded reflectors, and otherarticles used in lighting.

The semi-specular mirror films disclosed herein typically involve acombination of a specularly reflective multilayer optical film (MOF) andat least one scattering layer that is laminated or otherwise attached toa front major surface of the MOF, optionally with one or moreintervening layers of substantially solid light-transmissive material,but with no intervening optically thick air gap between the scatteringlayer and the MOF. The amount of scattering or haze provided by thescattering layer can be tailored to be small, medium, or large,depending upon the mix of specular and diffuse reflectivity that isdesired in the intended application.

We have developed semi-specular mirror films that incorporate both amultilayer optical film (MOF) having a wide reflection band, and ascattering layer. The amount of scattering can be tailored to provide adesired mix of specular and diffuse reflection so as to providesemi-specular reflectivity. In some embodiments, a low refractive indexTIR layer is sandwiched between the MOF and the scattering layer; inother embodiments, the scattering layer contacts the MOF directly. Inembodiments that include the TIR layer, the TIR layer preferably has ananovoided morphology and includes a polymer binder and a plurality ofparticles. In embodiments in which the scattering layer contacts the MOFdirectly, the scattering layer preferably also has a nanovoidedmorphology and includes a polymer binder and a plurality of particles.In any case, the resulting semi-specular mirror films can be made tohave very high total reflectivity, with corresponding low loss, over abroad wavelength band such as the visible spectrum, and can also betailored to have a controlled blend or mix of scattering and specularreflection.

The present application therefore discloses, inter alia, reflectivefilms that include a multilayer optical mirror film (an MOF) and adiffusing layer in contact with a first major surface of the MOF. TheMOF includes a plurality of microlayers configured to provide a broadreflection band, and the reflection band shifts as a function ofincidence angle. The diffusing layer is adapted to scatter visible lightinto the multilayer optical film over a range of angles such that thescattered light can be substantially reflected by the broad reflectionband. Further, the diffusing layer has a nanovoided morphology andcomprises a polymer binder, and preferably also comprises a plurality ofparticles.

The broad reflection band of the MOF may have, for normally incidentlight, a long wavelength band edge disposed at a wavelength no greaterthan 1000 nm, or no greater than 1200 nm, or no greater than 1400 nm, orno greater than 1600 nm, and the reflective film may provide visiblelight scattering corresponding to a transport ratio of less than 80%,and the reflective film may also have a total hemispheric reflectivityfor visible light of at least 97% when a rear surface of the reflectivefilm is in contact with an absorbing material. In some cases, thescattering provided by the film may be high enough so that transportratio is less than 60%, or less than 40%.

The diffusing layer may have a void volume fraction of at least 40%,50%, or 60%. In cases where the diffusing layer includes a plurality ofparticles, the particles may comprise silicon dioxide or aluminum oxide.The particles in the diffusing layer may also be characterized by a sizedistribution that includes small particles, aggregates, and agglomeratesof the small particles. A weight ratio of particles in the diffusinglayer to polymer binder in the diffusing layer may be at least 1, or atleast 2, or at least 4, or at least 6, or at least 7.

The diffusing layer may be characterized by a scattering distributioninto a substrate of refractive index n_(s) when illuminated by anormally incident beam of visible light, wherein n_(s) is a minimumrefractive index of the plurality of microlayers in the MOF. In somecases, the scattering distribution may be substantially reduced atgrazing angles in the substrate. The scattering distribution may have avalue S₀ at a scattering angle (i.e., deviation angle within thesubstrate relative to the normally incident beam) of 0 degrees and avalue S₆₀ at a scattering angle of 60 degrees, and S₆₀ may be less than10% of S₀. The scattering distribution may also have a value S₇₀ at ascattering angle of 70 degrees, and S₇₀ may similarly be less than 10%of S₀. The scattering distribution may have a value S₅₀ at a scatteringangle of 50 degrees, and S₅₀ may also be less than 10% of S₀.

We also disclose reflective films that include a multilayer opticalmirror film (an MOF), a diffusing layer, and a low refractive indexlayer (also referred to as a TIR layer) sandwiched between the MOF andthe diffusing layer. The MOF includes a plurality of microlayersconfigured to provide a broad reflection band, and the reflection bandshifts as a function of incidence angle. The diffusing layer is adaptedto scatter visible light into a first angular portion that, if coupledinto the multilayer optical film, can be substantially reflected by thebroad reflection band, and a second angular portion that, if coupledinto the multilayer optical film, cannot be substantially reflected bythe broad reflection band. The reflective film is preferably constructedsuch that visible light that is scattered into the second angularportion is substantially blocked from entering the multilayer opticalfilm by total internal reflection at the low refractive index layer. Thelow refractive index layer, sometimes also referred to as a TIR layer,has a nanovoided morphology and includes a polymer binder and alsopreferably a plurality of particles. The low refractive index layer mayhave a refractive index of less than 1.3 or less than 1.25, or less than1.2, for example.

The broad reflection band may have, for normally incident light, a longwavelength band edge disposed at a wavelength no greater than 1600 nm,or no greater than 1400 nm, or no greater than 1200 nm, or no greaterthan 1000 nm, and the reflective film may provide visible lightscattering corresponding to a transport ratio of less than 80%, thereflective film also having a total hemispheric reflectivity for visiblelight of at least 97% when a rear surface of the reflective film is incontact with an absorbing material. A short wavelength band edge of thebroad reflection band, for normally incident light, may be disposed ator near 400 nm, e.g. in a range from 350-450 nm. In some cases, thetransport ratio of the reflective film may be less than 60%, or lessthan 40%.

The low refractive index layer may have a void volume fraction of atleast 40%, 50%, or 60%. The particles in the low refractive index layermay comprise silicon dioxide. A weight ratio of the particles in the lowrefractive index layer to the polymer binder in the low refractive indexlayer may be at least 1, or at least 2, or at least 4, at least 6, or atleast 7.

Related methods, systems, and articles are also discussed.

These and other aspects of the present application will be apparent fromthe detailed description below. In no event, however, should the abovesummaries be construed as limitations on the claimed subject matter,which subject matter is defined solely by the attached claims, as may beamended during prosecution.

BRIEF DESCRIPTION OF DRAWINGS

FIG. 1a is a schematic side view of an optical cavity that employsspecular reflectors;

FIG. 1b is a schematic side view of an optical cavity that employsdiffuse reflectors;

FIG. 1c is a schematic side view of an optical cavity that employs asemi-specular reflector;

FIG. 2a is a schematic perspective view of a roll of multilayer opticalfilm or of a finished semi-specular mirror film;

FIG. 2b is a schematic side or sectional view of a multilayer opticalfilm, showing interior microlayers arranged in a packet to form a seriesof optical repeat units;

FIG. 3a is a schematic side or sectional view of a multilayer opticalfilm immersed in air, and

FIG. 3b is a similar view of the same film immersed in a higherrefractive index medium;

FIG. 4a is a schematic side or sectional view of a semi-specular mirrorfilm that incorporates a nanovoided TIR layer and a wide band MOF mirrorfilm;

FIG. 4b is a schematic side or sectional view of a semi-specular mirrorfilm that incorporates a nanovoided scattering layer and a wide band MOFmirror film;

FIG. 5a is a schematic view of primary particles organized into anaggregate particle;

FIG. 5b is a schematic view of aggregate particles organized into anagglomerate having a mesoporous structure;

FIG. 5c is a schematic side or sectional view of a semi-specular mirrorfilm that incorporates a mesoporous structure and a binder;

FIG. 5d is an enlarged schematic view of a portion of a nanovoided layersuitable for use in the mirror films of FIGS. 4a and 4 b;

FIG. 6 is a schematic side view of an optical system for measuringtransmissive scattering properties of an optical diffuser;

FIG. 7 is a schematic side view of an optical system for measuringreflective scattering properties of an optical diffuser;

FIG. 8a is a schematic perspective view of an optical system formeasuring total hemispherical reflectivity of an optical sample, andFIG. 8b is a schematic sectional view of the system of FIG. 8 a;

FIG. 9a is a plot of Scattering Intensity as a function of ScatteringAngle for a Comparative film; and

FIG. 9b is a family of plots of Scattering Intensity as a function ofScattering Angle for several Exemplary films.

In the figures, like reference numerals designate like elements.

DETAILED DESCRIPTION OF ILLUSTRATIVE EMBODIMENTS

As outlined above, we describe herein, among other things, semi-specularmirror films that advantageously incorporate at least one nanovoidedlayer having a polymer binder so as to achieve high total reflectivityand correspondingly low loss over a broad wavelength range of interestsuch as the visible spectrum. The void volume fraction of the nanovoidedlayer, i.e., the fractional volume of the layer occupied by voids(sometimes also referred to herein as “porosity”), may be at least 40%,or at least 50% or 60%. The high void volume fractions, in combinationwith the very small size distribution of the voids, allow for nanovoidedlayers that are characterized by very low effective refractive indices(provided the scattering or haze of the layer is low enough to permitmeasurement of the refractive index), e.g., less than 1.3, or less than1.25, or less than 1.2, but greater than 1. The nanovoided layer alsopreferably incorporates a plurality of particles. The particles maycomprise silicon dioxide or other inorganic or organic materials. Aweight ratio of the binder to particles in the nanovoided layer ispreferably between 1:7 to 1:2 or about 87.5% particles to 66.7%particles. The design details of the nanovoided layer can be tailored toprovide a significant amount of scattering or haze in some cases, andlittle or no significant scattering or haze in other cases. In theformer cases, the size distribution of the plurality of particlesthroughout the nanovoided layer may be characterized by a population ofsmall particles and a separate population of aggregates of the smallparticles. Such a distribution may be bimodal. If the nanovoided layeris made to have significant haze, it is preferably disposed directlyatop a broadband multilayer optical mirror film to provide a low losshigh reflectivity semi-specular mirror film. If the nanovoided layer ismade to have little or no significant haze, it is preferably disposedbetween a scattering layer and a broadband multilayer optical mirrorfilm to provide low loss high reflectivity semi-specular mirror film.

The disclosed semi-specular mirror films are compatible with high volumecontinuous and roll-to-roll manufacturing processes, although otherprocesses such as batch fabrication processes may be used if desired.FIG. 2a depicts a roll of multilayer optical film (MOF) 210 as is mayappear either before or after the further application of a scatteringlayer (and in some cases a low refractive index or TIR layer) to form asemi-specular reflective film. In the discussion that follows, we assumefor simplicity that the MOF 210 has not yet been combined with ascattering layer or TIR layer.

Broadband MOF Mirror Films

Although in most applications of interest to the present application theMOF 210 is designed to have a high reflectivity over a wavelength bandof interest such as the visible spectrum and for all polarizations andall practical incidence angles, in general the film may exhibit acertain amount of transmission, reflection, and absorption for light ofany given wavelength, incident direction, and polarization state. Ingeneral, transmission (T) plus reflection (R) plus absorption (A) of theMOF for any given incident light ray is 100%, or T+R+A=100%. Inexemplary embodiments, the MOF may be composed entirely of materialsthat have low absorption over at least a majority of the visiblewavelength spectrum. In such cases, the absorption A may be negligiblysmall, e.g. less than 1%, and the above relationship may be expressedas:T+R≈100%.

Turning now to FIG. 2b , we see there a portion of MOF 210 in schematicside view to reveal the structure of the film including its interiorlayers. The film is shown in relation to a local x-y-z Cartesiancoordinate system, where the film extends parallel to the x- and y-axes,and the z-axis is perpendicular to the film and its constituent layersand parallel to a thickness axis of the film. The film 210 need not beentirely flat, but may be curved or otherwise shaped to deviate from aplane, and even in those cases arbitrarily small portions or regions ofthe film can be associated with a local Cartesian coordinate system asshown.

Multilayer optical films include individual layers having differentrefractive indices so that some light is reflected at interfaces betweenadjacent layers. These layers, sometimes referred to as “microlayers”,are sufficiently thin so that light reflected at a plurality of theinterfaces undergoes constructive or destructive interference to givethe MOF the desired reflective or transmissive properties. Formultilayer optical films designed to reflect light at ultraviolet,visible, or near-infrared wavelengths, each microlayer generally has anoptical thickness (a physical thickness multiplied by refractive index)of less than about 1 μm. However, thicker layers can also be included,such as skin layers at the outer surfaces of the multilayer opticalfilm, or protective boundary layers (PBLs) disposed within themultilayer optical film to separate coherent groupings (known as“stacks” or “packets”) of microlayers. In FIG. 2b , the microlayers arelabeled “A” or “B”, the “A” layers being composed of one material andthe “B” layers being composed of a different material, these layersbeing stacked in an alternating arrangement to form Optical Repeat Unitsor unit cells ORU 1, ORU 2, . . . ORU 6 as shown. Typically, amultilayer optical film composed entirely of polymeric materials wouldinclude many more than 6 optical repeat units if high reflectivities aredesired. The substantially thicker layer 212 at the bottom of the figurecan represent an outer skin layer, or a PBL that separates the stack ofmicrolayers shown in the figure from another stack or packet ofmicrolayers (not shown). If desired, two or more separate multilayeroptical films can be laminated together, e.g. with one or more thickadhesive layers, or using pressure, heat, or other methods to form alaminate or composite film.

In some cases, the microlayers can have thicknesses and refractive indexvalues corresponding to a ¼-wave stack, i.e., arranged in optical repeatunits each having two adjacent microlayers of equal optical thickness(f-ratio=50%, the f-ratio being the ratio of the optical thickness of aconstituent layer “A” to the optical thickness of the complete opticalrepeat unit), such optical repeat unit being effective to reflect byconstructive interference light whose wavelength λ is twice the overalloptical thickness of the optical repeat unit, where the “opticalthickness” of a body refers to its physical thickness multiplied by itsrefractive index. In other cases, the optical thickness of themicrolayers in an optical repeat unit may be different from each other,whereby the f-ratio is greater than or less than 50%. In the embodimentof FIG. 2b , the “A” layers are depicted for generality as being thinnerthan the “B” layers. Each depicted optical repeat unit (ORU 1, ORU 2,etc.) has an optical thickness (OT₁, OT₂, etc.) equal to the sum of theoptical thicknesses of its constituent “A” and “B” layer, and eachoptical repeat unit reflects light whose wavelength λ is twice itsoverall optical thickness. The reflectivity provided by microlayerstacks or packets used in multilayer optical films in general istypically substantially specular in nature, rather than diffuse, as aresult of the generally smooth well-defined interfaces betweenmicrolayers, and the low haze materials that are used in a typicalconstruction.

In exemplary embodiments, the optical thicknesses of the optical repeatunits may differ according to a thickness gradient along the z-axis orthickness direction of the film, whereby the optical thickness of theoptical repeat units increases, decreases, or follows some otherfunctional relationship as one progresses from one side of the stack(e.g. the top) to the other side of the stack (e.g. the bottom). Suchthickness gradients can be used to provide a widened reflection band toprovide substantially spectrally flat transmission and reflection oflight over the extended wavelength band of interest, and also over allangles of interest. Thickness gradients tailored to sharpen the bandedges at the wavelength transition between high reflection and hightransmission can also be used, as discussed in U.S. Pat. No. 6,157,490(Wheatley et al.) “Optical Film With Sharpened Bandedge”. For polymericmultilayer optical films, reflection bands can be designed to havesharpened band edges as well as “flat top” reflection bands, in whichthe reflection properties are essentially constant across the wavelengthrange of application. Other layer arrangements, such as multilayeroptical films whose optical repeat units include more than twomicrolayers, are also contemplated.

For applications involving visible light, polymeric multilayer opticalfilms can be made with a reasonable number of microlayers and athickness gradient that produces a reflection band extending oversubstantially the entire visible spectrum so that reflected light haslittle or no observable “color” to an ordinary observer. For such films,the smallest values of the thickness gradient (i.e., the thinnest ORUs)can be selected so that the short wavelength band edge of the reflectionband (e.g. the short wavelength at which reflectivity drops to halfmaximum, for normally incident light) falls at or near 400 nm, e.g., ina range from 350 to 450 nm, for example. The largest values of thethickness gradient can be selected so that the long wavelength band edgeof the reflection band (e.g. the long wavelength at which reflectivitydrops to half maximum, for normally incident light) falls at a nearinfrared wavelength beyond the visual red limit of about 700 nm. Thelong wavelength band edge may be tailored to fall at a near infraredwavelength in a range from about 900-1600 nm, or from about 900-1400 nm,or from about 900-1200 nm, or from about 900-1000 nm, for example, butthese ranges are merely exemplary and should not be considered aslimiting. The long wavelength band edge is designed for such a nearinfrared wavelength so that the MOF is able to maintain highreflectivity for light in the wavelength range of interest that isincident on the film at non-normal incident angles. Thus, as light isincident on the film at increasingly oblique incident angles, thereflection band of the MOF (and its short and long band edges) shifts toincreasingly shorter wavelengths. At the design limit, the longwavelength band edge, which resides in the near infrared at normalincidence, shifts to a position at or near the visual red limit (e.g. ina range from 650-750 nm) for light at a maximum anticipated incidenceangle. The concomitant shift of the short wavelength band to a positionin the ultraviolet region is usually inconsequential to systemdesigners.

The reader will appreciate that even for MOF mirror films that areperfectly symmetrical for normally incident light (same reflectivityregardless of polarization), illumination with obliquely incident lightwill in general produce different reflectivities, and differentpositions of the short and long wavelength band edges of the reflectionband, depending on whether the s-polarized component or the p-polarizedcomponent of such oblique light is considered. Unless otherwise statedto the contrary, such differences between s- and p-polarizationreflectivity are ignored for purposes of this application.

As mentioned above, adjacent microlayers of the multilayer optical filmhave different refractive indices so that some light is reflected atinterfaces between adjacent layers. We refer to the refractive indicesof one of the microlayers (e.g. the “A” layers in FIG. 2b ) for lightpolarized along principal x-, y-, and z-axes as n1 x, n1 y, and n1 z,respectively. We refer to the refractive indices of the adjacentmicrolayer (e.g. the “B” layers in FIG. 2) along the same axes as n2 x,n2 y, n2 z, respectively. We refer to the differences in refractiveindex between the A and B layers as Δnx (=n1 x−n2 x) along thex-direction, Δny (=n1 y−n2 y) along the y-direction, and Δnz (=n1 z−n2z) along the z-direction. The nature of these refractive indexdifferences, in combination with the number of microlayers in the film(or in a given stack of the film) and their thickness distribution,controls the reflective and transmissive characteristics of the MOF (orof the given stack of the MOF).

For example, in order to make a mirror-like reflective film that hashigh reflectivity for normally incident light of any polarization state,the MOF is tailored such that adjacent microlayers have a largerefractive index mismatch along both orthogonal in-plane directions,i.e., Δnx large and Δny large. In this regard, a mirror film may beconsidered for purposes of this application to be an optical body thatstrongly reflects normally incident light that is polarized along onein-plane axis if the wavelength is within the reflection band of thepacket, and also strongly reflects such light that is polarized along anorthogonal in-plane axis. “Strongly reflects” may have differentmeanings depending on the intended application or field of use, but inmany cases an MOF mirror film will have at least 70, 80, 90, or 95%reflectivity for the specified light. Reflectivity of the mirror filmcan, but need not, be the same for the two orthogonal in-plane axes. Inthis regard, the distinction between a mirror film and a polarizer filmmay in some cases depend on the application or system in which the filmis to be used. In exemplary embodiments, the MOF mirror film is designedto have a reflectivity for normally incident light (averaged over thevisible spectrum) of at least 90%, or at least 95%, for light polarizedalong the x-axis as well as for light polarized along the y-axis.Reflectivities referred to herein can generally be converted tocorresponding transmissivities using the approximation R+T≈100%.

In variations of the foregoing embodiments, the adjacent microlayers mayexhibit a refractive index match or mismatch along the z-axis (Δnz≈0 orΔnz large), and the mismatch may be of the same or opposite polarity orsign as the in-plane refractive index mismatches. Such tailoring of Δnzplays a key role in whether the reflectivity of the p-polarizedcomponent of obliquely incident light increases, decreases, or remainsthe same with increasing incidence angle. In exemplary embodiments, theMOF mirror film, to the extent possible, maintains high reflectivityeven for highly oblique light, and may even provide increasedreflectivity at oblique angles so long as the wavelength of the light iswithin the reflection band for the particular oblique incident angle. Tohelp achieve this behavior, we may select Δnz between adjacentmicrolayers to be substantially zero, or to be non-zero with an oppositepolarity or sign as the in-plane refractive index mismatches.

Exemplary multilayer optical mirror films are composed of polymermaterials and may be fabricated using coextruding, casting, andorienting processes. Reference is made to U.S. Pat. No. 5,882,774 (Jonzaet al.) “Optical Film”, U.S. Pat. No. 6,179,949 (Merrill et al.)“Optical Film and Process for Manufacture Thereof”, and U.S. Pat. No.6,783,349 (Neavin et al.) “Apparatus for Making Multilayer OpticalFilms”. The multilayer optical film may be formed by coextrusion of thepolymers as described in any of the aforementioned references. Thepolymers of the various layers are preferably chosen to have similarrheological properties, e.g., melt viscosities, so that they can beco-extruded without significant flow disturbances. Extrusion conditionsare chosen to adequately feed, melt, mix, and pump the respectivepolymers as feed streams or melt streams in a continuous and stablemanner. Temperatures used to form and maintain each of the melt streamsmay be chosen to be within a range that avoids freezing,crystallization, or unduly high pressure drops at the low end of thetemperature range, and that avoids material degradation at the high endof the range.

In brief summary, the fabrication method may comprise: (a) providing atleast a first and a second stream of resin corresponding to the firstand second polymers to be used in the finished film; (b) dividing thefirst and the second streams into a plurality of layers using a suitablefeedblock, such as one that comprises: (i) a gradient plate comprisingfirst and second flow channels, where the first channel has across-sectional area that changes from a first position to a secondposition along the flow channel, (ii) a feeder tube plate having a firstplurality of conduits in fluid communication with the first flow channeland a second plurality of conduits in fluid communication with thesecond flow channel, each conduit feeding its own respective slot die,each conduit having a first end and a second end, the first end of theconduits being in fluid communication with the flow channels, and thesecond end of the conduits being in fluid communication with the slotdie, and (iii) optionally, an axial rod heater located proximal to saidconduits; (c) passing the composite stream through an extrusion die toform a multilayer web in which each layer is generally parallel to themajor surface of adjacent layers; and (d) casting the multilayer webonto a chill roll, sometimes referred to as a casting wheel or castingdrum, to form a cast multilayer film. This cast film may have the samenumber of layers as the finished film, but the layers of the cast filmare typically much thicker than those of the finished film. Furthermore,the layers of the cast film are typically all isotropic.

After cooling, the multilayer web can be drawn or stretched to producethe near-finished multilayer optical film, details of which can be foundin the references cited above. The drawing or stretching accomplishestwo goals: it thins the layers to their desired final thicknesses, andit orients the layers such that at least some of the layers becomebirefringent. The orientation or stretching can be accomplished alongthe cross-web direction (e.g. via a tenter), along the down-webdirection (e.g. via a length orienter), or any combination thereof,whether simultaneously or sequentially. If stretched along only onedirection, the stretch can be “unconstrained” (wherein the film isallowed to dimensionally relax in the in-plane direction perpendicularto the stretch direction) or “constrained” (wherein the film isconstrained and thus not allowed to dimensionally relax in the in-planedirection perpendicular to the stretch direction). If stretched alongboth in-plane directions, the stretch can be symmetric, i.e., equalalong the orthogonal in-plane directions, or asymmetric. Alternatively,the film may be stretched in a batch process. In any case, subsequent orconcurrent draw reduction, stress or strain equilibration, heat setting,and other processing operations can also be applied to the film.

The multilayer optical films and film bodies can also include additionallayers and coatings selected for their optical, mechanical, and/orchemical properties. For example, a UV absorbing layer can be added atone or both major outer surfaces of the film to protect the film fromlong-term degradation caused by UV light. Additional layers and coatingscan also include scratch resistant layers, tear resistant layers, andstiffening agents. See, e.g., U.S. Pat. No. 6,368,699 (Gilbert et al.).

FIG. 3a shows in schematic cross-section a thin film interference stack300 such as a MOF specularly reflective mirror film immersed in an airmedium of refractive index n₀=1. A Cartesian x-y-z coordinate system isalso shown for reference purposes. Light 312 of a particular wavelengthand polarization is incident on the stack at an angle θ₀, interactingwith the stack to produce a reflected beam 312 a and a transmitted beam312 b. The stack includes typically tens, hundreds, or thousands ofmicrolayers 314 a, 314 b, composed respectively of optical materials a,b arranged in an interference stack, for example a quarter-wave stack.Optical materials a, b can be any suitable materials known to haveutility in interference stacks, but are preferably organic and moreparticularly polymeric, e.g., polyethylene naphthalate (PEN), polymethylmethacrylate (PMMA), polyethylene terephthalate (PET), acrylic, andother conventional polymer materials such as those disclosed in U.S.Pat. No. 5,882,774 (Jonza et al.). Initially, for ease of explanation,we discuss the interaction of the incident beam 312 with the stack 300assuming the microlayers are isotropic, but the results can be readilyextended to birefringent microlayers.

Each of the microlayers 314 a, 314 b has an optical thickness that is afraction of a wavelength of light. The microlayers are arranged inrepeating patterns referred to as optical repeat units (ORUs) asdiscussed above, for example where the optical thickness of the ORU ishalf the wavelength of light to be reflected in the wavelength range ofinterest.

For simplicity of illustration, only the refracted portion of incidentlight 312 is depicted in FIG. 3a , but the reader will understand thatwavelets of reflected light are also produced at the interfaces of themicrolayers, and the coherent summation of those wavelets yields thereflected beam 312 a. As the incident light 312 encounters the stack300, it refracts from an angle of θ₀ in air to an angle of θ_(a) inmicrolayer 314 a. From there, it bends even further towards the surfacenormal (which is parallel to the z-axis) as it enters microlayer 314 b,achieving a propagation angle θ_(b). After more refractions in thealternating a,b layers, the light emerges as transmitted beam 312 b,which is also understood to be the coherent summation of all waveletstransmitted through the stack 300.

We now consider the effect of changing the direction of the incidentlight. If no limits are placed on the direction of the incident light,e.g., if we illuminate the stack from all directions in air, theincident angle θ₀ ranges from 0 to 90°. The light propagation angle inthe microlayers also changes, but because of the different refractiveindices they do not sweep out a 90 degree half-angle. Rather, they sweepout a half-angle of θ_(ac) for layers 314 a and θ_(bc) for layers 314 b.The angles θ_(ac) and θ_(bc) are the “critical angles” for the 314 alayers and the 314 b layers respectively. When the stack 300 is immersedin air, the critical angle for a given microlayer represents the maximumangle (measured in the given microlayer itself, relative to the surfacenormal or z-axis) that light originating from outside the stack willpropagate through the microlayer, provided the outer surfaces of thestack or film are substantially smooth and flat. The critical angleθ_(ac) can be calculated as sin⁻¹(1/n_(a)), where n_(a) is therefractive index of the layers 314 a, and the critical angle θ_(bc) canbe calculated as sin⁻¹(1/n_(b)), where n_(b) is the refractive index ofthe layers 314 b.

FIG. 3b schematically demonstrates what happens when the same stack 300is immersed in a denser medium whose refractive index n₀ is greater thanthat of air but about equal to or less than that of the lowestrefractive index microlayer in the stack, i.e., 1<n₀≤n_(a). In thiscase, an incident light beam 322 again interacts with the stack 300 toyield a reflected beam 322 a and a transmitted beam 322 b, and the angleof reflection for reflected beam 322 a and the angle of transmission fortransmitted beam 322 b are again equal to the angle of incidence θ₀ ofthe original beam. What is different from FIG. 3a , however, is how thelight propagates through the microlayers of the stack. Assuming theincident angle θ₀ of FIG. 3b is the same as that of FIG. 3a , the anglesof refraction θ_(a) and θ_(b) are greater (more oblique) in FIG. 3b thanthe corresponding angles in FIG. 3a . This is a consequence of Snell'slaw.

We again consider the effect of changing the direction of the incidentlight, but now for the case of light originating in the denser medium ofFIG. 3b . If no limits are placed on the direction of the incidentlight, e.g., if we illuminate the stack from all directions in thedenser medium (e.g. where the denser medium contains scatteringcenters), the incident angle θ₀ ranges from 0 to 90°, and the lightpropagation angle in the microlayers changes in accordance with Snell'slaw. n₀≈n_(a) then the propagation angle in the “a” microlayers sweepsout a full 90 degree half-angle, while the propagation angle in the “b”microlayers sweeps out a half-angle less than 90 degrees. If 1<n₀<n_(a)then the propagation angles in both the “a” and “b” microlayers sweep ahalf-angle less than 90 degrees. In both cases, however, the propagationangle in each of the microlayers sweeps out a half-angle that is greaterthan its respective critical angle in air. In other words, highlyoblique light that is incident from the denser medium will propagatethrough each microlayer at an angle that is greater than (more obliquethan) its critical angle. Such light, which is referred to assupercritical light, propagates through the microlayer stack at anglesreferred to as supercritical angles.

Unless appropriate steps are taken, this supercritical light can causethe reflectivity of the MOF film to degrade below acceptable levelsbecause of two factors: (1) the reflectivity, for the p-polarizedcomponent of the light, of each dielectric/dielectric interface betweenadjacent microlayers in the stack decreases with increasing incidenceangle—to a minimum of zero at Brewster's angle; and (2) the reflectionband of the stack shifts toward shorter optical wavelengths as the angleof incidence increases, shifting so far at extreme angles of incidencethat it no longer covers the entire wavelength range of interest, oreven so far that it no longer covers any portion of the wavelength rangeof interest. Regarding factor (1), the teachings of U.S. Pat. No.5,882,774 (Jonza et al.) provide guidance on how this problem can besolved by utilizing at least some birefringent microlayers in the stack,and by selecting refractive indices of adjacent microlayers so as toreduce, eliminate, or even reverse the usual behavior (exhibited withisotropic microlayers) of decreasing reflectivity of p-polarized lightwith increasing angle of incidence. Such an approach does not resolvefactor (2). In some cases, factor (2) can be resolved by simply addingmore microlayers to the MOF design to extend the ORU thickness gradientso that the normal incidence long wavelength band edge of the reflectionband is pushed farther out into the near infrared wavelength range, andso that the long wavelength band edge at the maximum anticipated obliqueincidence angle falls at or near the visual red limit (e.g. in a rangefrom 650-750 nm) so that high reflectivity is maintained over the entirewavelength range of interest.

In many cases, however, factor (2) cannot be resolved simply by addingmore microlayers (and more ORUs) to the stack to extend the reflectionband. Such cases may arise in embodiments that attempt to combine theMOF mirror film with one or more scattering layers that are opticallycoupled to the MOF in such a way as to allow extreme levels ofsupercritical light to propagate through the MOF. In such cases, thehighly oblique propagation angle of the supercritical light may be sogreat that the “blue-shifted” reflection band allows some light withinthe wavelength range of interest (e.g., red and yellow wavelengthswithin the visible wavelength range), or even substantially all lightwithin the wavelength range of interest (e.g. all visible wavelengths)to propagate entirely through the MOF. Light that propagates through theMOF mirror film in this way can theoretically reflect off of the back orrear major surface of the MOF, provided that surface is smooth, clean,and exposed to air, but dirt, oils, adhesives, scratches, and/or otherlossy components or features can result in the light being absorbed orotherwise lost at that surface, thus detracting from the overallreflectivity and from the overall efficiency of the mirror construction.

Semi-Specular Mirror Film Constructions

To resolve such issues, we turn to one or both of the semispecularmirror designs shown in FIGS. 4a and 4 b.

In FIG. 4a , a semi-specular mirror film 410 incorporates a specularlyreflective wide band MOF mirror film 412, a scattering layer 414, and ananovoided TIR layer 416. The scattering layer 414 has a rear surfacethat is coincident with a front surface 416 a of the TIR layer 416, andthe TIR layer 416 has a rear surface 416 b that is coincident with afront surface 412 a of the mirror film 412. A rear surface 412 b of themirror film 412 is also the rear surface of the semi-specular mirrorfilm 410.

A light beam 420 is shown to be incident on the front surface of thefilm 410 at an angle of incidence θ₁. This light may have a narrowwavelength band in the wavelength range of interest, or it may bebroadband, e.g., covering the entire wavelength range of interest suchas the visible spectrum. A portion of this light is specularly reflectedto provide specularly reflected light 422 a, e.g., by passing throughlayers 414, 416, being reflected by MOF mirror film 412, and passingback through layers 416, 414. The specularly reflected light 422 a isreflected at an angle θ₂=θ₁. Substantially the remaining portion of theincident light is reflected diffusely over substantially the entirehemisphere of solid angle that defines the space in front of (ratherthan behind) the film 410. This scattered light is represented in thefigure by scattered light rays 422 b. The semi-specular mirror film 410is advantageously designed not only to have high overall reflectivityand low loss, but also such that little or none of the incident lightreaches the back surface 412 b of the MOF mirror film 412, since dirt orother lossy components or features on that surface may detract from theoverall reflectivity of the film semi-specular film 410.

This design goal is achieved in the following way. The scattering layer414 scatters incident light in all directions within the layer. Thescattered light includes a first portion that, if coupled into the MOFfilm 412, can be substantially reflected by the broad reflection band,e.g., with a reflectivity of at least 80, 85, 90, or 95% or more. Thescattered light also includes a second portion that, if coupled into theMOF film 412, cannot be substantially reflected by the broad reflectionband, e.g., it may have a reflectivity of less than 95, 90, 85, 80, 70,60, or 50%. The second portion of the scattered light is associated withpropagation directions within the scattering layer 414 that are moreoblique than those of the first portion of the scattered light. Thesemi-specular mirror film 410 advantageously incorporates the TIR layer416 between the scattering layer 414 and the MOF film 412 in order toblock the second portion of the scattered light from reaching the MOFfilm 412. The TIR layer is composed of a material whose refractive indexis greater than that of air (about 1.0) but tailored to be low enough sothat the second portion of the scattered light is substantially allreflected at the interface 416 a between the scattering layer and theTIR layer 416. At the same time, the refractive index of the TIR layeris high enough so that the first portion of the scattered light is nottotally internally reflected at the interface 416 a, but propagatesthrough the TIR layer 416 and is reflected by the (blue-shifted)reflection band of the MOF mirror film 412. The TIR layer has ananovoided morphology and includes a polymer binder and also preferablya plurality of particles, as discussed further below.

The TIR layer 416 may have a refractive index of less than 1.3 or lessthan 1.25, or less than 1.2, for example, but greater than 1 or greaterthan 1.1. Moreover, it may have a void volume fraction of at least 30%,40%, 50%, or 60%. If particles are included in the TIR layer, theparticles may comprise silicon dioxide or other suitable materials. Aweight ratio of the particles in the TIR layer to the polymer binder inthe TIR layer may be at least 1, or at least 2, or at least 4, or atleast 6, or at least 7.

The broad reflection band of the MOF mirror film 412 may have, fornormally incident light, a long wavelength band edge disposed at awavelength no greater than 1600 nm, or no greater than 1400 nm, or nogreater than 1200 nm, or no greater than 1000 nm, and a short wavelengthband edge, for normally incident light, at a wavelength at or near 400nm, e.g., in a range from 350-400 nm. Such an MOF mirror film, whenincorporated into a semi-specular reflective film construction such asthat of FIG. 4a , may provide a total hemispheric reflectivity forvisible light of at least 97% when the rear surface of the MOF mirrorfilm is in contact with an absorbing material, and may provide a degreeof scattering for visible light corresponding to a transport ratio ofless than 80%, or less than 60%, or less than 40%.

An alternative semi-specular mirror design is shown in FIG. 4b . In thatfigure, a semi-specular mirror film 450 incorporates a specularlyreflective wide band MOF mirror film 452 and a nanovoided scatteringlayer 454. The mirror film 452 may be the same as or similar to the MOFmirror film 412 of FIG. 4a . The scattering layer 454 has a nanovoidedmorphology as described further below. A rear surface of the scatteringlayer 454 is coincident with a front surface 452 a of the MOF mirrorfilm 452, and a rear surface 452 b of the mirror film 452 is also therear surface of the semi-specular mirror film 450. An optional sealinglayer 457 may be provided on the exposed major surface of the nanovoidedscattering layer 454 in order to seal off the nanovoided layer andprevent liquid, gaseous, or molten substances from penetrating into thenanovoided layer.

A light beam 460 is shown to be incident on the front surface of thefilm 450 at an angle of incidence θ₁. This light may have a narrowwavelength band in the wavelength range of interest, or it may bebroadband, e.g., covering the entire wavelength range of interest suchas the visible spectrum. A portion of this light is specularly reflectedto provide specularly reflected light 462 a, e.g., by passing throughlayer 454, being reflected by MOF mirror film 452, and passing backthrough layer 454. The specularly reflected light 462 a is reflected atan angle θ₂=θ₁. Substantially the remaining portion of the incidentlight is reflected diffusely over substantially the entire hemisphere ofsolid angle that defines the space in front of (rather than behind) thefilm 450. This scattered light is represented in the figure by scatteredlight rays 462 b. Like the semi-specular mirror film of FIG. 4a , thesemi-specular mirror film 450 is also advantageously designed not onlyto have high overall reflectivity and low loss, but also such thatlittle or none of the incident light reaches the back surface 452 b ofthe MOF mirror film 452, since dirt or other lossy components orfeatures on that surface may detract from the overall reflectivity ofthe film semi-specular film 450.

This design goal is achieved in the following way. The scattering layer454 is tailored to scatter light into the MOF mirror film over a rangeof angles such that the scattered light can be substantially reflectedby the broad reflection band. In order to accomplish this, thescattering layer 454 may have a nanovoided morphology and comprise apolymer binder, and it preferably also comprises a plurality ofparticles, as discussed further below.

The scattering layer may have a void volume fraction of at least 40%,50%, or 60%. In cases where the scattering layer includes a plurality ofparticles, the particles may comprise silicon dioxide. The particles inthe scattering layer may also be characterized by a size distributionthat includes small particles, aggregates, and agglomerates of the smallparticles. A weight ratio of particles in the scattering layer topolymer binder in the scattering layer may be at least 1, or at least 2,or at least 4, or at least 6, or at least 7.

The nanovoided scattering layer may be characterized by a scatteringdistribution into a substrate of refractive index “n_(s)” whenilluminated by a normally incident beam of visible light, wherein“n_(s)” is a minimum refractive index of the plurality of microlayers inthe MOF mirror film. In some cases, the nanovoided scattering layer maybe tailored to provide a scattering distribution that is not uniform asa function of scattering direction. The scattering distribution mayadvantageously be substantially reduced at grazing angles in thesubstrate, such that little or no highly oblique scattered light isproduced that would propagate to the back surface of the MOF mirrorfilm. For example, the scattering distribution of the nanovoidedscattering layer 454 may have a value S₀ at a scattering angle (i.e.,deviation angle within the substrate relative to the normally incidentbeam) of 0 degrees and a value S₆₀ at a scattering angle of 60 degrees,and S₆₀ may be less than 10% of S₀. The scattering distribution may alsohave a value S₇₀ at a scattering angle of 70 degrees, and S₇₀ maysimilarly be less than 10% of S₀. The scattering distribution may have avalue S₅₀ at a scattering angle of 50 degrees, and S₅₀ may also be lessthan 10% of S₀.

In some cases it may be difficult to measure or quantify the refractiveindex of the nanovoided scattering layer 454, particularly when thedegree of scattering or haze is high. The high scattering may, forexample, make it difficult to detect with any precision a reflected beamwhen such a layer is subjected to the so-called prism coupling method ofrefractive index measurement. Thus, in some cases, depending on theamount of scattering provided by the nanovoided scattering layer, it maynot be possible to characterize such a layer in terms of an index ofrefraction.

The broad reflection band of the MOF mirror film 452 may have, fornormally incident light, a long wavelength band edge disposed at awavelength no greater than 1600 nm, or no greater than 1400 nm, or nogreater than 1200 nm, or no greater than 1000 nm, and a short wavelengthband edge, for normally incident light, at a wavelength at or near 400nm, e.g., in a range from 350-400 nm. Such an MOF mirror film, whenincorporated into a semi-specular reflective film construction such asthat of FIG. 4b , may provide a total hemispheric reflectivity forvisible light of at least 97% when the rear surface of the MOF mirrorfilm is in contact with an absorbing material, and may provide a degreeof scattering for visible light corresponding to a transport ratio ofless than 80%, or less than 60%, or less than 40%.

Nanovoided Layers

Some embodiments of the semi-specular mirror films of the presentdisclosure include one or more low refractive index layers that includea plurality of voids dispersed in a binder. The voids have an index ofrefraction n_(v) and a permittivity ∈_(v), where n_(v) ²=∈_(v), and thebinder has an index of refraction n_(b) and a permittivity ∈_(b), wheren_(b) ²=∈_(b). In general, the interaction of a low refractive indexlayer with light, such as light that is incident on, or propagates in,the low refractive index layer, depends on a number of film or layercharacteristics such as, for example, the film or layer thickness, thebinder index, the void or pore index, the pore shape and size, thespatial distribution of the pores, and the wavelength of light. In someembodiments, light that is incident on or propagates within the lowrefractive index layer, “sees” or “experiences” an effectivepermittivity ∈_(eff) and an effective index n_(eff), where n_(eff) canbe expressed in terms of the void index n_(v), the binder index n_(b),and the void porosity or volume fraction “f”. In such embodiments, thelow refractive index layer is sufficiently thick and the voids aresufficiently small so that light cannot resolve the shape and featuresof a single or isolated void. In such embodiments, the size of at leasta majority of the voids, such as at least 60% or 70% or 80% or 90% ofthe voids, is not greater than about λ/5, or not greater than about λ/6,or not greater than about λ/8, or not greater than about λ/10, or notgreater than about λ/20, where λ is the wavelength of light. In someembodiments, some of the voids can be sufficiently small so that theirprimary optical effect is to reduce the effective index, while someother voids can reduce the effective index and scatter light, whilestill some other voids can be sufficiently large so that their primaryoptical effect is to scatter light.

In some embodiments, the light that is incident on the low refractiveindex layer is visible light, meaning that the wavelength of the lightis in the visible range of the electromagnetic spectrum. In suchembodiments, the visible light has a wavelength that is in a range offrom about 380 nm to about 750 nm, or from about 400 nm to about 700 nm,or from about 420 nm to about 680 nm. In such embodiments, the lowrefractive index layer has an effective index of refraction and includesa plurality of voids if the size of at least a majority of the voids,such as at least 60% or 70% or 80% or 90% of the voids, is not greaterthan about 70 nm, or not greater than about 60 nm, or not greater thanabout 50 nm, or not greater than about 40 nm, or not greater than about30 nm, or not greater than about 20 nm, or not greater than about 10 nm.

In some embodiments, the low refractive index layer is sufficientlythick so that the low refractive index layer has an effective index thatcan be expressed in terms of the indices of refraction of the voids andthe binder, and the void or pore volume fraction or porosity. In suchembodiments, the thickness of the low refractive index layer is not lessthan about 1 micrometer, or not less than about 2 micrometers, or in arange from 1 to 20 micrometers.

When the voids in a disclosed low refractive index layer aresufficiently small and the low refractive index layer is sufficientlythick, the low refractive index layer has an effective permittivity∈_(eff) that can be expressed as:∈_(eff) =f∈ _(v)+(1−f)∈_(b)  (1)

In such embodiments, the effective index n_(eff) of the optical film orlow refractive index layer can be expressed as:n _(eff) ² =fn _(v) ²+(1−f)n _(b) ²  (2)

In some embodiments, such as when the difference between the indices ofrefraction of the pores and the binder is sufficiently small, theeffective index of the low refractive index layer can be approximated bythe following expression:n _(eff) =fn _(v)+(1−f)n _(b)  (3)

In such embodiments, the effective index of the low refractive indexlayer is the volume weighted average of the indices of refraction of thevoids and the binder. Under ambient conditions, the voids contain air,and thus the refractive index n_(v) for the voids is approximately 1.00.For example, a low refractive index layer that has a void volumefraction of about 50% and a binder that has an index of refraction ofabout 1.5, has an effective index of about 1.25.

In some embodiments, the effective index of refraction of low refractiveindex layer is not greater than (or is less than) about 1.3, or lessthan about 1.25, or less than about 1.23, or less than about 1.2, orless than about 1.15. In some embodiments, the refractive index isbetween about 1.14 and about 1.30. In some embodiments, low refractiveindex layer includes a binder, a plurality of particles, and a pluralityof interconnected voids or a network of interconnected voids.

A plurality of interconnected voids or a network of interconnected voidscan occur in a number of methods. In one process, the inherent porosityof highly structured, high surface area fumed metal oxides, such asfumed silica oxides, is exploited in a mixture of binder to form acomposite structure that combines binder, particles, voids andoptionally crosslinkers or other adjuvant materials. The desirablebinder to particle ratio is dependent upon the type of process used toform the interconnected voided structure.

While a binder resin is not a prerequisite for the porous fumed silicastructure to form, it is typically desirable to incorporate some type ofpolymeric resin or binder in with the metal oxide network to improve theprocessing, coating quality, adhesion and durability of the finalconstruction. Examples of useful binder resins are those derived fromthermosetting, thermoplastic and UV curable polymers. Examples includepolyvinylalcohol, (PVA), polyvinylbutyral (PVB), polyvinyl pyrrolidone(PVP), polyethylene vinyl acetate copolymers (EVA), cellulose acetatebutyrate (CAB) polyurethanes (PURs), polymethylmethacrylate (PMMA),polyacrylates, epoxies, silicones and fluoropolymers. The binders couldbe soluble in an appropriate solvent such as water, ethyl acetate,acetone, 2-butone, and the like, or they could be used as dispersions oremulsions. Examples of some commercially available binders useful in themixtures are those available from Kuraray-USA, Wacker Chemical, DyneonLLC, and Rohm and Haas. Although the binder can be a polymeric system,it can also be added as a polymerizable monomeric system, such as a UV,or thermally curable or crosslinkable system. Examples of such systemswould be UV polymerizable acrylates, methacrylates, multi-functionalacrylates, urethane-acrylates, and mixtures thereof. Some typicalexamples would be 1,6-hexane diol diacrylate, trimethylol propanetriacrylates, pentaerythritol triacrylate. Actinic radiation such asE-beam and UV active systems are well known and are readily availablefrom such suppliers as Neo Res (Newark, Del.), Arkema (Philadelphia,Pa.), or Sartomer (Exton, Pa.). Other useful binder systems arecationically polymerizable systems such as vinyl ethers and epoxides.

The polymeric binders can also be formulated with cross linkers that canchemically bond with the polymeric binder to form a crosslinked network.Although the formation of crosslinks is not a prerequisite for theformation of the porous structure or the low refractive index opticalproperties, it is often desirable for other functional reasons such asto improve the cohesive strength of the coating, adhesion to thesubstrate or moisture, thermal and solvent resistance. The specific typeof crosslinker is dependent upon the binder used. Typical crosslinkersfor polymeric binders such as PVA would be diisocyanates, titanates suchas TYZOR-LA™ (available from DuPont, Wilmington, Del.),poly(epichlorohydrin)amide adducts such as PolyCup 172, (available fromHercules, Wilmington, Del.), multi-functional aziridines such as CX100(available from Neo-Res, Newark, Del.) and boric acid, diepoxidesdiacids and the like.

The polymeric binders may form a separate phase with the particleaggregates or may be inter-dispersed between the particle aggregates ina manner to “bind” the aggregates together into a structures connectingwith the metal oxidize particles through direct covalent bond formationor molecular interactions such as ionic, dipole, van der Waals forces,hydrogen bonding and physical entanglements with the metal oxides.

Exemplary particles include fumed metal oxides or pyrogenic metaloxides, such as, for example, a fumed silica or alumina. In someembodiments, particles that are highly branched or structured may beused. Such particles prevent efficient packing in the binder matrix andallow interstitial voids or pores to form. Exemplary materials includinghighly branched or structured particles include Cabo-Sil™ fumed silicasor silica dispersions, such as, for example, those sold under tradedesignations TS 520, or pre-dispersed fumed silica particles such asthose available as Cabo-Sperse™ PG 001, PG 002, 1020K, 1015. Fumedalumina oxides are also useful structured particles to form a lowrefractive index system although silica is preferred since it has aninherent by lower skeletal refractive index than alumina. Examples ofalumina oxide are available under the trade name Cabo-Sperse, such as,for example, those sold under the trade designation Cabo-Sperse™ PG003or Cabot Spec-Al™.

Referring now to FIG. 5a , in some embodiments, aggregates 505 of theseexemplary fumed metal oxides comprise a plurality of primary particles515 in the range of about 8 nm to about 20 nm and form a highly branchedstructure with a wide distribution of sizes ranging from about 80 nm togreater than 300 nm. Referring now to FIG. 5b , in some embodiments,these aggregates 505 of primary particles 515 pack randomly in a unitvolume of a coating to form agglomerates having a mesoporous structure525 with complex bi-continuous network of channels, tunnels, and pores535 which entrap air in the network and thus lower the density andrefractive index of the coating. Other useful porous materials arederived from naturally occurring inorganic materials such as clays,barium sulfates, aluminum, silicates and the like. The low refractiveindex layer has an effective refractive index of 1.23 or less when themetal oxide is silica oxide and 1.33 or less then the metal oxide isalumina oxide.

Referring now to FIG. 5c , in some embodiments, primary particles 515,aggregates 505, and agglomerates having a mesoporous structure 525 arecombined with binder 565 and deposited as a TIR layer 555 on a substrate545. In some embodiments, the binder 565 does not fill the bi-continuousnetwork of channels, tunnels, and pores 535, which results in the TIRlayer 555 being a nanovoided layer. Depending on details of compositionand structure, the nanovoided TIR layer 555 may represent the layer 416in FIG. 4a , and/or the layer 454 in FIG. 4 b.

Fumed silica particles can also be treated with a surface treatmentagent. Surface-treatment of the metal oxide particles can provide, forexample, improved dispersion in the polymeric binder, altered surfaceproperties, enhanced particle-binder interactions, and/or reactivity. Insome embodiments, the surface-treatment stabilizes the particles so thatthe particles are well dispersed in the binder, resulting in asubstantially more homogeneous composition. The incorporation of surfacemodified inorganic particles can be tailored, for example, to enhancecovalent bonding of the particles to the binder and to thereby provide amore durable and more homogeneous polymer/particle network.

The preferred type of treatment agent is determined, in part, by thechemical nature of the metal oxide surface. Silanes are preferred forsilica and other for siliceous fillers. In the case of silanes, it maybe preferred to react the silanes with the particle surface beforeincorporation into the binder. The required amount of surface modifieris dependant upon several factors such as, for example, particle size,particle type, modifier molecular weight, and/or modifier type. Thesilane modifier can have reactive groups that form covalent bondsbetween particles and the binder such as, for example, carboxy, alcohol,isocynanate, acryloxy, epoxy, thiol or amines. Conversely, the silanemodifier can have non-reactive groups, such as, for example, alkyl,alkloxy, phenyl, phenyloxy, polyethers, or mixtures thereof. Suchnon-reactive groups may modify the surface of the coatings to improve,for example, soil and dirt resistance or to improve static dissipation.Commercially available examples of a surface modified silica particleinclude, for example, Cabo-Sil™ TS 720 and TS 530. It may sometimes bedesirable to incorporate a mixture of functional and non-function groupson the surface of the particles to obtain a combination of thesedesirable features.

Representative embodiments of surface treatment agents suitable for usein the compositions of the present disclosure include, for example,N-(3-triethoxysilylpropyl)methoxyethoxyethoxyethyl carbamate,N-(3-triethoxysilylpropyl)methoxyethoxyethoxyethyl carbamate,3-(methacryloyloxy)propyltrimethoxysilane,3-acryloxypropyltrimethoxysilane,3-(methacryloyloxy)propyltriethoxysilane,3-(methacryloyloxy)propylmethyldimethoxysilane,3-(acryloyloxypropyl)methyldimethoxysilane,3-(methacryloyloxy)propyldimethylethoxysilane,3-(methacryloyloxy)propyldimethylethoxysilane,vinyldimethylethoxysilane, phenyltrimethoxysilane,n-octyltrimethoxysilane, dodecyltrimethoxysilane,octadecyltrimethoxysilane, propyltrimethoxysilane,hexyltrimethoxysilane, vinylmethyldiacetoxysilane,vinylmethyldiethoxysilane, vinyltriacetoxysilane, vinyltriethoxysilane,vinyltriisopropoxysilane, vinyltrimethoxysilane, vinyltriphenoxysilane,vinyltri-t-butoxysilane, vinyltris-isobutoxysilane,vinyltriisopropenoxysilane, vinyltris(2-methoxyethoxy)silane,styrylethyltrimethoxysilane, mercaptopropyltrimethoxysilane,3-glycidoxypropyltrimethoxysilane, acrylic acid, methacrylic acid, oleicacid, stearic acid, dodecanoic acid, 2-[2-(2-methoxyethoxy)ethoxy]aceticacid (MEEAA), beta-carboxyethylacrylate (BCEA),2-(2-methoxyethoxy)acetic acid, methoxyphenyl acetic acid, and mixturesthereof.

Particle volume concentration (PVC) and critical particle volumeconcentration (CPVC) can be used to characterize the porosity of acoating. The terms PVC and CPVC are well defined terms in the paint andpigment literature and are further defined well referenced articles andtechnical books, such as, for example “Paint Flow and PigmentDispersion”, Patton, T. C., 2^(nd) Edition, J. Wiley Interscience, 1978,Chapter 5, p. 126 and “Modeling Cluster Voids and Pigment Distributionto Predict Properties and CPVC in Coatings. Part 1: Dry CoatingAnalysis” and Sudduth, R. D; Pigment and Resin Technology, 2008, 37(6).p. 375.) When the volume concentration of the particles is larger thanCPVC, the coating is porous since there is not enough binder to fill allthe gaps between the particles and the interstitial regions of thecoating. The coating then becomes a mixture of binder, particles, andvoids. The volume concentration at which this occurs is related toparticle size and particle structure and/or shape. Formulations withvolume concentrations above CPVC have a volume deficiency of resin inthe mixture that is replaced by air. The relationship between CPVC, PVCand porosity is:

${Porosity} = {1 - \frac{CPVC}{PVC}}$

As used in this discussion of CPVC, the term “pigment” is equivalent toparticles and the term “resin” is equivalent to binder. In certainbinder-particle systems, when the volume concentration of the particlesexceeds a critical value known, as the CPVC, the mixture becomes porous.Thus the coating becomes essentially a mixture of binder, particles, andair, because there is insufficient binder to fill all the gaps betweenthe particles and the interstitial regions of the coating. When thisoccurs, the volume concentration is related to at least one of thepigment particle size distribution, wetting, and the particle structureor shape. Materials that provide desired low refractive index propertieshave submicron pores derived from particle-binder mixtures that arehighly structured and formulated above their CPVC. In some embodiments,optical articles have CPVC values that are not greater than (or are lessthan) about 60%, or less than about 50%, or less than about 40%.

As described above, particles that are highly branched or structuredprevent efficient packing in the binder matrix and allow interstitialvoids or pores to form. In contrast, material combinations which fallbelow the desired CPVC will not be sufficiently porous. The BET method(described above) may be helpful in determining CPVC and thus porosityof low index materials because the BET method analyzes pores which areless than 200 nm in diameter, less than 100 nm in diameter, or even lessthan 10 nm in diameter. BET data can assist in the characterization ofmaterials that meet minimum requirements for forming a porous structure.

The volume concentration of the particles described by the PVC/CPVCrelationship is also related to the weight concentration of theparticles. Therefore it is possible to establish particle weight rangesthat are above the CPVC. The use of weight ratio or weight percent isone way to formulate mixtures with the desirable CPVC values. For theoptical constructions of the present disclosure, weight ratios of binderto particle from 1:1 to 1:10 are desirable. A weight ratio of 1:1 is theequivalent of about 50 wt % particle where as 1:8 is equivalent to about89 wt % particle. Exemplary binder to metal oxide particle ratios areless than 1:2 (less than 33% binder), less than 1:3, less than 1:4, lessthan 1:5, less than 1:6, less than 1:7, less than 1:8, less than 1:9,and less than 1:10 (about 8-10% binder). The lower limit of binder maybe dictated by the desired refractive index. The lower limit of bindermay be dictated by the desired physical properties, e.g., processing orfinal durability characteristics. Thus the binder to particle ratio willvary depending on the desired end use and the desired optical articleproperties.

In general, low refractive index layer can have any porosity, pore-sizedistribution, or void volume fraction that may be desirable in anapplication. In some embodiments, the volume fraction of plurality ofthe voids in the low refractive index layer is not less than about 20%,or not less than about 30%, or not less than about 40%, or not less thanabout 50%, or not less than about 60%, or not less than about 70%, ornot less than about 80%, or not less than about 90%.

In some embodiments, some of the particles have reactive groups andothers do not have reactive groups. For example in some embodiments,about 10% of the particles have reactive groups and about 90% of theparticles do not have reactive groups, or about 15% of the particleshave reactive groups and about 85% of the particles do not have reactivegroups, or about 20% of the particles have reactive groups and about 80%of the particles do not have reactive groups, or about 25% of theparticles have reactive groups and about 75% of the particles do nothave reactive groups, or about 30% of the particles have reactive groupsand about 60% of the particles do not have reactive groups, or about 35%of the particles have reactive groups and about 65% of the particles donot have reactive groups, or about 40% of the particles have reactivegroups and about 60% of the particles do not have reactive groups, orabout 45% of the particles have reactive groups and about 55% of theparticles do not have reactive groups, or about 50% of the particleshave reactive groups and about 50% of the particles do not have reactivegroups. In some embodiments, some of the particles may be functionalizedwith both reactive and unreactive groups on the same particle.

The ensemble of particles may include a mixture of sizes, reactive andnon-reactive particles and different types of particles, for example,organic particles including polymeric particles such as acrylics,polycarbonates, polystyrenes, silicones and the like; or inorganicparticles such as glasses or ceramics including, for example, silica andzirconium oxide, and the like.

In some embodiments, the low refractive index layers or material has aBET porosity that is greater than about 40% (which corresponds to asurface area of about 50 m²/g as determined by the BET method), porositygreater than about 50% (which corresponds to a surface area of about65-70 m²/g as determined by the BET method), greater than about 60%(which corresponds to a surface area of about 80-90 m²/g as determinedby the BET method), and most preferably between about 65% and about 80%(which corresponds to a somewhat higher surface area of values greaterthan about 100 m²/g as determined by the BET method). In someembodiments, the volume fraction of the plurality of interconnectedvoids in the low refractive index layer is not less than (or is greaterthan) about 20%, or greater than about 30%, or greater than about 40%,or greater than about 50%, or greater than about 60%, or greater thanabout 70%, or greater than about 90%. Generally it can be shown highersurface areas indicated higher percent porosity and thus lowerrefractive index, but the relationship between these parameters iscomplicated. The values shown here are only for purposes of guidance andnot meant to exemplify a limiting correlation between these properties.The BET surface area and percent porosity values will be dictated by theneed to balance the low refractive index and other critical performanceproperties such as cohesive strength of the coating. As used herein, theterm “BET method” refers to the Braunauer, Emmett, and Teller surfacearea analysis (See S. Brunauer, P. H. Emmett and E. Teller, J. Am. Chem.Soc., 1938, 60, 309). The BET method is a well-known method used todetermine pore size, surface area, and percent porosity of a solidsubstance. BET theory relates to the physical adsorption of gasmolecules on a solid surface and serves as the basis for obtainingphysical information about the surface area and porosity of a solidsurface.

There are numerous coating techniques known in the art useful to makethe embodiments described herein. The more common techniques are, butnot limited to, well known roll-to-roll automated processes such asknife bar, slot die, slide, curtain, roll and Gravure coatingtechniques. It is also possible to coat these solutions usingnon-continuous methods such as inkjet, screen, offset printing, dip andspray coating techniques. While the exact coating technique is notcritical to obtain the low refractive index properties some techniquesenable multiple layers to be coated onto the substrate simultaneouslyand this improves the economics of the coating process. The desiredfinal application will dictate which technique is preferred.

FIG. 5d is an enlarged schematic view of a portion of an alternativenanovoided layer 500 suitable for use in the semi-specular mirror filmconstructions of FIGS. 4a and 4b . For example, the nanovoided layerportion 500 may represent the volume portion 405 of layer 416 in FIG. 4a, and/or the volume portion 455 of layer 454 in FIG. 4 b.

Exemplary nanovoided layers 500 include a plurality of interconnectedvoids or a network of voids 520 dispersed in a binder 510. At least someof the voids in the plurality or network are connected to one anothervia hollow tunnels or hollow tunnel-like passages. The interconnectedvoids may be the remnant of an interconnected mass of solvent thatformed part of an originally coated film, and that was driven out of thefilm by the oven or other means after curing of the polymerizablematerial. Further details of construction and fabrication can be foundin commonly assigned U.S. patent application Ser. No. 61/294,610, filedJan. 13, 2010. The network of voids 520 can be regarded to includeinterconnected voids or pores 520A-520C as shown in FIG. 5. The voidsare not necessarily free of all matter and/or particulates. For example,in some cases, a void may include one or more small fiber- orstring-like objects that include, for example, a binder and/ornanoparticles. Some disclosed nanovoided layers may include multiplesets of interconnected voids or multiple networks of voids where thevoids in each set or network are interconnected. In some cases, inaddition to multiple pluralities or sets of interconnected voids, thenanovoided layer may also include a plurality of closed or unconnectedvoids, meaning that the voids are not connected to other voids viatunnels. In cases where a network of voids 520 forms one or morepassages that extend from a first major surface to an opposed secondmajor surface of the nanovoided layer 500, the layer 500 may bedescribed as being a porous layer.

Some of the voids can reside at or interrupt a surface of the nanovoidedmicrostructured layer and can be considered to be surface voids. Forexample, if the upper and lower bounds of the volume 500, as shown inFIG. 5, represent opposed major surfaces of a nanovoided layer, thevoids 520D and 520E would reside at one major surface of the nanovoidedlayer and could be regarded as surface voids 520D and 520E, and voids520F and 520G would reside at the opposite major surface of thenanovoided layer and could be regarded as surface voids 520F and 520G.Some of the voids, such as voids 520B and 520C, are disposed within theinterior of the nanovoided layer and away from the exterior surfaces,and can thus be regarded as interior voids 520B and 520C even though aninterior void may be connected to a major surface via one or more othervoids.

Voids 520 have a size d1 that can generally be controlled by choosingsuitable composition and fabrication, such as coating, drying, andcuring conditions. In general, d1 can be any desired value in anydesired range of values. For example, in some cases, at least a majorityof the voids, such as at least 60% or 70% or 80% or 90% or 95% of thevoids, have a size that is in a desired range. For example, in somecases, at least a majority of the voids, such as at least 60% or 70% or80% or 90% or 95% of the voids, have a size that is not greater thanabout 10 micrometers, or not greater than about 7, or 5, or 4, or 3, or2, or 1, or 0.7, or 0.5 micrometers.

In some cases, a plurality of interconnected voids 520 has an averagevoid or pore size that is not greater than about 5 micrometers, or notgreater than about 4 micrometers, or not greater than about 3micrometers, or not greater than about 2 micrometers, or not greaterthan about 1 micrometer, or not greater than about 0.7 micrometers, ornot greater than about 0.5 micrometers.

In some cases, some of the voids can be sufficiently small so that theirprimary optical effect is to reduce the effective index, while someother voids can reduce the effective index and scatter light, whilestill some other voids can be sufficiently large so that their primaryoptical effect is to scatter light.

The nanovoided layer 500 may have any useful thickness (linear distancebetween opposed major surfaces of the layer). In many embodiments thenanovoided layer may have a thickness that is not less than about 100nm, or not less than about 500 nm, or not less than about 1,000 nm, orin a range from 0.1 to 10 micrometers, or in a range from 1 to 100micrometers.

In some cases, the nanovoided layer may be thick enough so that thenanovoided layer can reasonably have an effective refractive index thatcan be expressed in terms of the indices of refraction of the voids andthe binder, and the void or pore volume fraction or porosity. In suchcases, the thickness of the nanovoided layer is not less than about 500nm, or not less than about 1,000 nm, or in a range from 1 to 10micrometers, or in a range from 500 nm to 100 micrometers, for example.

When the voids in a disclosed nanovoided layers are sufficiently smalland the nanovoided layer is sufficiently thick, the nanovoided layer hasan effective permittivity ∈_(eff) that can be expressed as:∈_(eff)=(f)∈_(v)+(1−f)∈_(b),  (1)

where ∈_(v) and ∈_(b) are the permittivities of the voids and the binderrespectively, and f is the volume fraction of the voids in thenanovoided layer. In such cases, the effective refractive index n_(eff)of the nanovoided layer can be expressed as:n _(eff) ²=(f)n _(v) ²+(1−f)n _(b) ²,  (2)

where n_(v) and n_(b) are the refractive indices of the voids and thebinder respectively. In some cases, such as when the difference betweenthe indices of refraction of the voids and the binder is sufficientlysmall, the effective index of the nanovoided layer can be approximatedby the following expression:n _(eff)≈(f)n _(v)+(1−f)n _(b),  (3)

In such cases, the effective index of the nanovoided layer is the volumeweighted average of the indices of refraction of the voids and thebinder. For example, a nanovoided layer that has a void volume fractionof 50% and a binder that has an index of refraction of 1.5 has aneffective index of about 1.25 as calculated by equation (3), and aneffective index of about 1.27 as calculated by the more precise equation(2). In some exemplary embodiments the nanovoided layer may have aneffective refractive index in a range from 1.15 to 1.35. In someembodiments the nanovoided microstructured layer may have an effectiverefractive index in a range from 1.16 to 1.30.

The nanovoided layer 500 of FIG. 5d is also shown to include, inaddition to the plurality of interconnected voids or network of voids520 dispersed in the binder 510, an optional plurality of nanoparticles540 dispersed substantially uniformly within the binder 510.

Nanoparticles 540 have a size d2 that can be any desired value in anydesired range of values. For example, in some cases at least a majorityof the particles, such as at least 60% or 70% or 80% or 90% or 95% ofthe particles, have a size that is in a desired range. For example, insome cases, at least a majority of the particles, such as at least 60%or 70% or 80% or 90% or 95% of the particles, have a size that is notgreater than about 1 micrometer, or not greater than about 700, or 500,or 200, or 100, or 50 nanometers. In some cases, the plurality ofnanoparticles 540 may have an average particle size that is not greaterthan about 1 micrometer, or not greater than about 700, or 500, or 200,or 100, or 50 nanometers.

In some cases, some of the nanoparticles can be sufficiently small sothat they primarily affect the effective index, while some othernanoparticles can affect the effective index and scatter light, whilestill some other particles can be sufficiently large so that theirprimary optical effect is to scatter light.

The nanoparticles 540 may or may not be functionalized. In some cases,some, most, or substantially all of the nanoparticles 540, such asnanoparticle 540B, are not functionalized. In some cases, some, most, orsubstantially all of the nanoparticles 540 are functionalized or surfacetreated so that they can be dispersed in a desired solvent or binder 510with no, or very little, clumping. In some embodiments, nanoparticles540 can be further functionalized to chemically bond to binder 510. Forexample, nanoparticles such as nanoparticle 540A, can be surfacemodified or surface treated to have reactive functionalities or groups560 to chemically bond to binder 510. Nanoparticles can befunctionalized with multiple chemistries, as desired. In such cases, atleast a significant fraction of nanoparticles 540A are chemically boundto the binder. In some cases, nanoparticles 540 do not have reactivefunctionalities to chemically bond to binder 510. In such cases,nanoparticles 540 can be physically bound to binder 510.

In some cases, some of the nanoparticles have reactive groups and othersdo not have reactive groups. An ensemble of nanoparticles can include amixture of sizes, reactive and nonreactive particles, and differenttypes of particles (e.g., silica and zirconium oxide). In some cases,the nanoparticles may include surface treated silica nanoparticles.

The nanoparticles may be inorganic nanoparticles, organic (e.g.,polymeric) nanoparticles, or a combination of organic and inorganicnanoparticles. Furthermore, the nanoparticles may be porous particles,hollow particles, solid particles, or combinations thereof. Examples ofsuitable inorganic nanoparticles include silica and metal oxidenanoparticles including zirconia, titania, ceria, alumina, iron oxide,vanadia, antimony oxide, tin oxide, alumina/silica, and combinationsthereof. The nanoparticles can have an average particle diameter lessthan about 1000 nm, or less than about 100 or 50 nm, or the average maybe in a range from about 3 to 50 nm, or from about 3 to 35 nm, or fromabout 5 to 25 nm. If the nanoparticles are aggregated, the maximum crosssectional dimension of the aggregated particle can be within any ofthese ranges, and can also be greater than about 100 nm. In someembodiments, “fumed” nanoparticles, such as silica and alumina, withprimary size less than about 50 nm, are also included, such asCAB-O-SPERSE® PG 002 fumed silica, CAB-O-SPERSE® 2017A fumed silica, andCAB-O-SPERSE® PG 003 fumed alumina, available from Cabot Co. Boston,Mass.

The nanoparticles may include surface groups selected from the groupconsisting of hydrophobic groups, hydrophilic groups, and combinationsthereof. Alternatively, the nanoparticles may include surface groupsderived from an agent selected from the group consisting of a silane,organic acid, organic base, and combinations thereof. In otherembodiments, the nanoparticles include organosilyl surface groupsderived from an agent selected from the group consisting of alkylsilane,arylsilane, alkoxysilane, and combinations thereof.

The term “surface-modified nanoparticle” refers to a particle thatincludes surface groups attached to the surface of the particle. Thesurface groups modify the character of the particle. The terms “particlediameter” and “particle size” refer to the maximum cross-sectionaldimension of a particle. If the particle is present in the form of anaggregate, the terms “particle diameter” and “particle size” refer tothe maximum cross-sectional dimension of the aggregate. In some cases,particles can be large aspect ratio aggregates of nanoparticles, such asfumed silica particles.

The surface-modified nanoparticles have surface groups that modify thesolubility characteristics of the nanoparticles. The surface groups aregenerally selected to render the particle compatible with the coatingsolution. In some cases, the surface groups can be selected to associateor react with at least one component of the coating solution, to becomea chemically bound part of the polymerized network.

A variety of methods are available for modifying the surface ofnanoparticles including, e.g., adding a surface modifying agent tonanoparticles (e.g., in the form of a powder or a colloidal dispersion)and allowing the surface modifying agent to react with thenanoparticles. Other useful surface modification processes are describedin, e.g., U.S. Pat. No. 2,801,185 (Iler) and U.S. Pat. No. 4,522,958(Das et al.).

Useful surface-modified silica nanoparticles include silicananoparticles surface-modified with silane surface modifying agentsincluding, e.g., Silquest® silanes such as Silquest® A-1230 from GESilicones, 3-acryloyloxypropyl trimethoxysilane,3-methacryloyloxypropyltrimethoxysilane,3-mercaptopropyltrimethoxysilane, noctyltrimethoxysilane,isooctyltrimethoxysilane, 4-(triethoxysilyl)-butyronitrile,(2-cyanoethyl)triethoxysilane,N-(3-triethoxysilylpropyl)methoxyethoxyethoxyethyl carbamate (PEG3TMS),N-(3-triethoxysilylpropyl)methoxyethoxyethoxyethyl carbamate (PEG2TMS),3-(methacryloyloxy)propyltriethoxysilane,3-(methacryloyloxy)propylmethyldimethoxysilane,3-(acryloyloxypropyl)methyldimethoxysilane,3-(methacryloyloxy)propyldimethylethoxysilane,3-(methacryloyloxy)propyldimethylethoxysilane,vinyldimethylethoxysilane, phenyltrimethoxysilane,noctyltrimethoxysilane, dodecyltrimethoxysilane,octadecyltrimethoxysilane, propyltrimethoxysilane,hexyltrimethoxysilane, vinylmethyldiacetoxysilane,vinylmethyldiethoxysilane, vinyltriacetoxysilane, vinyltriethoxysilane,vinyltriisopropoxysilane, vinyltrimethoxysilane, vinyltriphenoxysilane,vinyltri-tbutoxysilane, vinyltris-isobutoxysilane,vinyltriisopropenoxysilane, vinyltris(2-methoxyethoxy)silane, andcombinations thereof. Silica nanoparticles can be treated with a numberof surface modifying agents including, e.g., alcohol, organosilaneincluding, e.g., alkyltrichlorosilanes, trialkoxyarylsilanes,trialkoxy(alkyl)silanes, and combinations thereof, and organotitanatesand mixtures thereof.

The nanoparticles may be provided in the form of a colloidal dispersion.Examples of useful commercially available unmodified silica startingmaterials include nano-sized colloidal silicas available under theproduct designations NALCO 1040, 1050, 1060, 2326, 2327, and 2329colloidal silica from Nalco Chemical Co., Naperville, Ill.; theorganosilica under the product name IPA-ST-MS, IPA-ST-L, IPA-ST,IPA-ST-UP, MA-ST-M, and MA-ST sols from Nissan Chemical America Co.Houston, Tex. and the SnowTex® ST-40, ST-50, ST-20L, ST-C, ST-N, ST-O,ST-OL, ST-ZL, ST-UP, and ST-OUP, also from Nissan Chemical America Co.Houston, Tex. The weight ratio of polymerizable material tonanoparticles can range from about 30:70, 40:60, 50:50, 55:45, 60:40,70:30, 80:20 or 90:10 or more. The preferred ranges of wt % ofnanoparticles range from about 10% by weight to about 60% by weight, andcan depend on the density and size of the nanoparticle used.

In some cases, the nanovoided microstructured layer 300 may have a lowoptical haze value. In such cases, the optical haze of the nanovoidedmicrostructured layer may be no more than about 5%, or no greater thanabout 4, 3.5, 3, 2.5, 2, 1.5, or 1%. For light normally incident onnanovoided microstructured layer 300, “optical haze” may (unlessotherwise indicated) refer to the ratio of the transmitted light thatdeviates from the normal direction by more than 4 degrees to the totaltransmitted light. Optical transmittance, clarity, and haze may bemeasured, for example, using a Haze-Gard Plus™ haze meter, or aHaze-Gloss™ meter, both available from BYK-Gardner, Silver Springs, Md.Alternative techniques for characterizing haze and scattering arediscussed below.

In some cases, the nanovoided layer 500 may have a high optical haze. Insuch cases, the haze of the nanovoided microstructured layer 500 may beat least about 40%, or at least about 50, 60, 70, 80, 90, or 95%. Inother cases, the nanovoided layer 500 can be made to have a small orinsubstantial amount of haze or scattering.

In general, the nanovoided layer 500 can have any porosity or voidvolume fraction that may be desirable in an application. In some cases,the volume fraction of plurality of voids 520 in the nanovoided layer500 is at least about 10%, or at least about 20, 30, 40, 50, 60, 70, 80,or 90%.

Binder 510 can be or include any material that may be desirable in anapplication. For example, binder 510 can be a light curable materialthat forms a polymer, such as a crosslinked polymer. In general, binder510 can be any polymerizable material, such as a polymerizable materialthat is radiation-curable. In some embodiments binder 510 can be anypolymerizable material, such as a polymerizable material that isthermally-curable.

Polymerizable material 510 can be any polymerizable material that can bepolymerized by various conventional anionic, cationic, free radical orother polymerization technique, which can be chemically, thermally, orinitiated with actinic radiation, e.g., processes using actinicradiation including, e.g., visible and ultraviolet light, electron beamradiation and combinations thereof, among other means. The media thatpolymerizations can be carried out in include, including, e.g., solventpolymerization, emulsion polymerization, suspension polymerization, bulkpolymerization, and the like.

Actinic radiation curable materials include monomers, and reactiveoligomers, and polymers of acrylates, methacrylates, urethanes, epoxies,and the like. Representative examples of actinic radiation curablegroups suitable in the practice of the present disclosure include epoxygroups, ethylenically unsaturated groups such as (meth)acrylate groups,olefinic carboncarbon double bonds, allyloxy groups, alpha-methylstyrene groups, (meth)acrylamide groups, cyanoester groups, vinyl ethersgroups, combinations of these, and the like. Free radicallypolymerizable groups are preferred. In some embodiments, exemplarymaterials include acrylate and methacrylate functional monomers,oligomers, and polymers, and in particular, multifunctional monomersthat can form a crosslinked network upon polymerization can be used, asknown in the art. The polymerizable materials can include any mixture ofmonomers, oligomers, and polymers; however the materials should be atleast partially soluble in at least one solvent. In some embodiments,the materials should be soluble in the solvent monomer mixture. As usedherein, the term “monomer” means a relatively low molecular weightmaterial (i.e., having a molecular weight less than about 500 g/mole)having one or more polymerizable groups. “Oligomer” means a relativelyintermediate molecular weight material having a molecular weight of fromabout 500 up to about 10,000 g/mole. “Polymer” means a relatively highmolecular weight material having a molecular weight of at least about10,000 g/mole, preferably at 10,000 to 100,000 g/mole. The term“molecular weight” as used throughout this specification means numberaverage molecular weight, unless expressly noted otherwise.

Exemplary monomeric polymerizable materials include styrene,alpha-methylstyrene, substituted styrene, vinyl esters, vinyl ethers,N-vinyl-2-pyrrolidone, (meth)acrylamide, Nsubstituted (meth)acrylamide,octyl(meth)acrylate, iso-octyl(meth)acrylate, nonylphenolethoxylate(meth)acrylate, isononyl(meth)acrylate, diethyleneglycol(meth)acrylate, isobornyl(meth)acrylate,2-(2-ethoxyethoxy)ethyl(meth)acrylate, 2-ethylhexyl(meth)acrylate,lauryl(meth)acrylate, butanediol mono(meth)acrylate,beta-carboxyethyl(meth)acrylate, isobutyl(meth)acrylate, cycloaliphaticepoxide, alpha-epoxide, 2-hydroxyethyl(meth)acrylate,(meth)acrylonitrile, maleic anhydride, itaconic acid,isodecyl(meth)acrylate, dodecyl(meth)acrylate, n-butyl(meth)acrylate,methyl(meth)acrylate, hexyl(meth)acrylate, (meth)acrylic acid,N-vinylcaprolactam, stearyl(meth)acrylate, hydroxyl functionalpolycaprolactone ester(meth)acrylate, hydroxyethyl(meth)acrylate,hydroxymethyl(meth)acrylate, hydroxypropyl(meth)acrylate,hydroxyisopropyl(meth)acrylate, hydroxybutyl(meth)acrylate,hydroxyisobutyl(meth)acrylate, tetrahydrofurfuryl(meth)acrylate,combinations of these, and the like.

Functional oligomers and polymers may also be collectively referred toherein as “higher molecular weight constituents or species.” Suitablehigher molecular weight constituents may be incorporated intocompositions of the present disclosure. Such higher molecular weightconstituents may provide benefits including viscosity control, reducedshrinkage upon curing, durability, flexibility, adhesion to porous andnonporous substrates, outdoor weatherability, and/or the like. Theamount of oligomers and/or polymers incorporated into fluid compositionsof the present disclosure may vary within a wide range depending uponsuch factors as the intended use of the resultant composition, thenature of the reactive diluent, the nature and weight average molecularweight of the oligomers and/or polymers, and the like. The oligomersand/or polymers themselves may be straight-chained, branched, and/orcyclic. Branched oligomers and/or polymers tend to have lower viscositythan straight-chain counterparts of comparable molecular weight.

Exemplary polymerizable oligomers or polymers include aliphaticpolyurethanes, acrylics, polyesters, polyimides, polyamides, epoxypolymers, polystyrene (including copolymers of styrene) and substitutedstyrenes, silicone containing polymers, fluorinated polymers,combinations of these, and the like. For some applications, polyurethaneand acrylate oligomers and/or polymers can have improved durability andweatherability characteristics. Such materials also tend to be readilysoluble in reactive diluents formed from radiation curable,(meth)acrylate functional monomers.

Because aromatic constituents of oligomers and/or polymers generallytend to have poor weatherability and/or poor resistance to sunlight,aromatic constituents can be limited to less than 5 weight percent,preferably less than 1 weight percent, and can be substantially excludedfrom the oligomers and/or polymers and the reactive diluents of thepresent disclosure. Accordingly, straight-chained, branched and/orcyclic aliphatic and/or heterocyclic ingredients are preferred forforming oligomers and/or polymers to be used in outdoor applications.

Suitable radiation curable oligomers and/or polymers for use in thepresent disclosure include, but are not limited to, (meth)acrylatedurethanes (i.e., urethane(meth)acrylates), (meth)acrylated epoxies(i.e., epoxy(meth)acrylates), (meth)acrylated polyesters (i.e.,polyester(meth)acrylates), (meth)acrylated(meth)acrylics,(meth)acrylated silicones, (meth)acrylated polyethers (i.e.,polyether(meth)acrylates), vinyl(meth)acrylates, and (meth)acrylatedoils.

The solvent used during manufacture of the nanovoided layer can be anysolvent that forms a solution with the desired polymerizable material.The solvent can be a polar or a non-polar solvent, a high boiling pointsolvent or a low boiling point solvent, and in some embodiments thesolvent includes a mixture of several solvents. The solvent or solventmixture may be selected so that the nanovoided layer formed is at leastpartially insoluble in the solvent (or at least one of the solvents in asolvent mixture). In some embodiments, the solvent mixture can be amixture of a solvent and a non-solvent for the polymerizable material.In one particular embodiment, the insoluble polymer matrix can be athree-dimensional polymer matrix having polymer chain linkages thatprovide the three dimensional framework. The polymer chain linkages canprevent deformation of the layer after removal of the solvent.

In some cases, solvent can be easily removed from the solvent-ladenmicrostructured layer by drying, for example, at temperatures notexceeding the decomposition temperature of either the insoluble polymermatrix, or the substrate on which it is carried. In one particularembodiment, the temperature during drying is kept below a temperature atwhich the substrate is prone to deformation, e.g., a warping temperatureor a glass-transition temperature of the substrate. Exemplary solventsinclude linear, branched, and cyclic hydrocarbons, alcohols, ketones,and ethers, including for example, propylene glycol ethers such asDOWANOL™ PM propylene glycol methyl ether, isopropyl alcohol, ethanol,toluene, ethyl acetate, 2-butanone, butyl acetate, methyl isobutylketone, methyl ethyl ketone, cyclohexanone, acetone, aromatichydrocarbons, isophorone, butyrolactone, N-methylpyrrolidone,tetrahydrofuran, esters such as lactates, acetates, propylene glycolmonomethyl ether acetate (PM acetate), diethylene glycol ethyl etheracetate (DE acetate), ethylene glycol butyl ether acetate (EB acetate),dipropylene glycol monomethyl acetate (DPM acetate), iso-alkyl esters,isohexyl acetate, isoheptyl acetate, isooctyl acetate, isononyl acetate,isodecyl acetate, isododecyl acetate, isotridecyl acetate or otheriso-alkyl esters, water; combinations of these and the like.

The coating solution used during manufacture of the nanovoided layer canalso include other ingredients including, e.g., initiators, curingagents, cure accelerators, catalysts, crosslinking agents, tackifiers,plasticizers, dyes, surfactants, flame retardants, coupling agents,pigments, impact modifiers including thermoplastic or thermosetpolymers, flow control agents, foaming agents, fillers, glass andpolymer microspheres and microparticles, other particles includingelectrically conductive particles, thermally conductive particles,fibers, antistatic agents, antioxidants, optical down converters such asphosphors, UV absorbers, and the like.

An initiator, such as a photoinitiator, can be used in an amounteffective to facilitate polymerization of the monomers present in thecoating solution. The amount of photoinitiator can vary depending upon,for example, the type of initiator, the molecular weight of theinitiator, the intended application of the resulting microstructuredlayer, and the polymerization process including, e.g., the temperatureof the process and the wavelength of the actinic radiation used. Usefulphotoinitiators include, for example, those available from CibaSpecialty Chemicals under the IRGACURE™ and DAROCURE™ tradedesignations, including IRGACURE™ 184 and IRGACURE™ 819.

In some embodiments, a mixture of initiators and initiator types can beused, for example to control the polymerization in different sections ofthe process. In one embodiment, optional post-processing polymerizationmay be a thermally initiated polymerization that requires a thermallygenerated free-radical initiator. In other embodiments, optionalpost-processing polymerization may be an actinic radiation initiatedpolymerization that requires a photoinitiator. The post-processingphotoinitiator may be the same or different than the photoinitiator usedto polymerize the polymer matrix in solution.

The nanovoided layer may be cross-linked to provide a more rigid polymernetwork. Cross-linking can be achieved with or without a cross-linkingagent by using high energy radiation such as gamma or electron beamradiation. In some embodiments, a cross-linking agent or a combinationof cross-linking agents can be added to the mixture of polymerizablemonomers, oligomers or polymers. The cross-linking can occur duringpolymerization of the polymer network using any of the actinic radiationsources described elsewhere.

Useful radiation curing cross-linking agents include multifunctionalacrylates and methacrylates, such as those disclosed in U.S. Pat. No.4,379,201 (Heilmann et al.), which include 1,6-hexanedioldi(meth)acrylate, trimethylolpropane tri(meth)acrylate, 1,2-ethyleneglycol di(meth)acrylate, pentaerythritol tri/tetra(meth)acrylate,triethylene glycol di(meth)acrylate, ethoxylated trimethylolpropanetri(meth)acrylate, glycerol tri(meth)acrylate, neopentyl glycoldi(meth)acrylate, tetraethylene glycol di(meth)acrylate, 1,12-dodecanoldi(meth)acrylate, copolymerizable aromatic ketone co-monomers such asthose disclosed in U.S. Pat. No. 4,737,559 (Kellen et al.) and the like,and combinations thereof.

The coating solution used during manufacture of the nanovoided layer mayalso include a chain transfer agent. The chain transfer agent ispreferably soluble in the monomer mixture prior to polymerization.Examples of suitable chain transfer agents include triethyl silane andmercaptans. In some embodiments, chain transfer can also occur to thesolvent; however this may not be a preferred mechanism.

The polymerizing step may include using a radiation source in anatmosphere that has a low oxygen concentration. Oxygen is known toquench free-radical polymerization, resulting in diminished extent ofcure. The radiation source used for achieving polymerization and/orcrosslinking may be actinic (e.g., radiation having a wavelength in theultraviolet or visible region of the spectrum), accelerated particles(e.g., electron beam radiation), thermal (e.g., heat or infraredradiation), or the like. In some embodiments, the energy is actinicradiation or accelerated particles, because such energy providesexcellent control over the initiation and rate of polymerization and/orcrosslinking. Additionally, actinic radiation and accelerated particlescan be used for curing at relatively low temperatures. This avoidsdegrading or evaporating components that might be sensitive to therelatively high temperatures that might be required to initiatepolymerization and/or crosslinking of the energy curable groups whenusing thermal curing techniques. Suitable sources of curing energyinclude UV LEDs, visible LEDs, lasers, electron beams, mercury lamps,xenon lamps, carbon arc lamps, tungsten filament lamps, flashlamps,sunlight, low intensity ultraviolet light (black light), and the like.

In some embodiments, binder 510 may include a multifunctional acrylateand polyurethane. This binder 510 can be a polymerization product of aphotoinitiator, a multifunctional acrylate, and a polyurethane oligomer.The combination of a multifunctional acrylate and a polyurethaneoligomer can produce a more durable nanovoided layer 500. Thepolyurethane oligomer is ethylenically unsaturated. In some embodiments,the polyurethane or polyurethane oligomer is capable of reacting withacrylates or “capped” with an acrylate to be capable of reacting withother acrylates in the polymerization reaction described herein.

In one illustrative process, a solution is prepared that includes aplurality of nanoparticles (optional), and a polymerizable materialdissolved in a solvent, where the polymerizable material can include,for example, one or more types of monomers. The polymerizable materialis coated onto a substrate and a tool is applied to the coating whilethe polymerizable material is polymerized, for example by applying heator light, to form an insoluble polymer matrix in the solvent. In somecases, after the polymerization step, the solvent may still include someof the polymerizable material, although at a lower concentration. Next,the solvent is removed by drying or evaporating the solution resultingin nanovoided layer 500 that includes a network or plurality of voids520 dispersed in polymer binder 510. The nanovoided microstructuredlayer 500 includes a plurality of nanoparticles 540 dispersed in thepolymer binder. The nanoparticles are bound to the binder, where thebonding can be physical or chemical.

The fabrication of the nanovoided layer 500 and semi-specular reflectivemirror articles described herein using the processes described hereincan be performed in a temperature range that is compatible with the useof organic substances, resins, films and supports. In many embodiments,the peak process temperatures (as determined by an optical thermometeraimed at the nanovoided microstructured layer 500) may be 200 degreescentigrade or less, or 150 degrees centigrade or less, or 100 degreescentigrade or less.

In general, nanovoided microstructured layer 500 can have a desirableporosity for any weight ratio of binder 510 to plurality ofnanoparticles 540. Accordingly, in general, the weight ratio can be anyvalue that may be desirable in an application. In some cases, the weightratio of binder 510 to a plurality of nanoparticles 540 is at leastabout 1:2.5, or at least about 1:2.3, or 1:2, or 1:1, or 1.5:1, or 2:1,or 2.5:1, or 3:1, or 3.5:1, or 4:1, or 5:1. In some cases, the weightratio is in a range from about 1:2.3 to about 4:1.

The nanovoided layer can be tailored to have little scattering in somecases and significant scattering in other cases. This can be done byselecting the particle type and/or adjusting the particle concentration(as a proportion to the binder). If this is done in such a way that isfavorable to the formation of large agglomerates and/or a large numberof large-sized aggregates, the layer will be a significant scatterer. Ifthis is done in such a way that is favorable to the formation of a smallnumber of small-sized aggregates, the layer will have little scattering.

Scattering and Haze; Hemispheric Reflectivity

We now turn to FIGS. 6, 7, 8 a, and 8 b for further discussion andexplanation of techniques for characterizing the haze or scatteringprovided by an optical body (FIGS. 6 and 7), and for characterizing thetotal hemispherical reflectivity of an optical body (FIGS. 8a and 8b ).

We have already mentioned one approach for characterizing the haze orscattering provided by an optical body, namely, measuring the haze ofthe sample using a Haze-Gard Plus™ haze meter available fromBYK-Gardner, Silver Springs, Md., or the like. In general terms, such aninstrument calculates a ratio of the transmitted light that deviatesfrom the normal direction by more than 4 degrees to the totaltransmitted light.

FIG. 6 is a schematic side view of an optical system 600 for measuringscattering or haze properties of a transmissive optical body 630. Theoptical body may be, for example, an optically clear substrate with ananovoided scattering layer to be studied, or it may be another body orlayer that scatters light via scattering centers distributed throughoutthe volume of the layer. The system 600 may be centered on an opticalaxis 690, relative to which scattering angles θ can be measured. Thesystem 600 includes a hemisphere 610 that includes a spherical surface605, a flat bottom surface 615, and an index of refraction “n_(h)”. Thesystem 600 also includes the optically diffusive film 630 to be tested,which is laminated to the bottom surface 615 of the hemisphere via anoptical adhesive layer 620. The system 600 also includes a light source640 that emits light 645, the light 645 preferably being substantiallycollimated and comprising wavelengths covering the wavelength range ofinterest, or a portion thereof. Also included is an optical detector 650for detecting light that is scattered by test sample 630. The detector650 is movably mounted as indicated so that measurements can be madeover a range of scattering angles θ, e.g. from −90 to +90 degrees, sothat the functional relationship of scattering intensity versusscattering angle can be determined.

Light 645 emitted by light source 640 propagates along optical axis 690and is scattered by the optical body 630 inside the half-sphere 610,which has a relatively high refractive index n_(h), i.e., n_(h) is muchgreater than the refractive index of air. Accordingly, in the presenceof the hemisphere, the optical system 600 measures the scattering of theoptical body in a high-index medium. In an exemplary embodiment, thehemisphere is made of solid acrylic with a diameter of 63 mm and arefractive index of about 1.49, and the light source emits white lightwith a beam diameter of about 4 mm, but other design parameters can alsobe selected as appropriate. Ideally, the scattered light rays 660originate near the center of curvature of the hemispheric surface 605.Thus, the rays 660 are transmitted through the surface 605 with littleor no refraction, allowing the full hemispherical range of lightscattered within the solid hemisphere to be extracted and measured inair. The adhesive layer 620 may be optically clear adhesive OCA 8171™available from 3M, St Paul, Minn., which has a refractive index of about1.47, but other clear adhesives or coupling gels or liquids may also beused. Preferably, the refractive index of the layer 620 is about equalto that of the hemisphere 610. In many cases, the refractive index ofthe acrylic hemisphere is about the same as the lowest refractive indexof the microlayers within a broadband polymeric MOF mirror film. Inthose cases, measuring the scattering distribution of the optical body630 in the system 600 essentially reveals how the light scattered by theoptical body will propagate within the microlayers of an MOF mirror filmwhen the optical body is attached or otherwise directly opticallycoupled to the MOF mirror film.

As described further below, we have found that nanovoided scatteringlayers can be made to exhibit a scattering distribution thatadvantageously provides substantially diminished scattering at very highangles of propagation within the scattering layer (and at very highangles of propagation within the MOF mirror film, and in particularwithin the lowest refractive index microlayers of the MOF mirror film)relative to a Lambertian scatterer. The scattering intensity may forexample be greatly reduced over a range of glancing incidence angles,e.g., from 50 to 90 degrees, or from 60 to 80 degrees, or from 60 to 70degrees, relative to light scattered at 0 degrees (along the opticalaxis or thickness axis of the layer or film). For example, the diffusinglayer may be characterized by a scattering distribution into a substrateof refractive index “n_(s)” (where n_(s) is a minimum refractive indexof the microlayers within the MOF mirror film to which the diffusinglayer is coupled) when illuminated by a normally incident beam ofvisible light. The scattering distribution may have a value S₀ at ascattering angle (i.e., a deviation angle within the substrate relativeto the normally incident beam) of 0 degrees and a value S₆₀ at ascattering angle of 60 degrees, and S₆₀ may be less than 10% of S₀. Thescattering distribution may have a value S₇₀ at a scattering angle of 70degrees and a value S₅₀ at a scattering angle of 50 degrees, and S₇₀ andS₅₀ may also be less than 10% of S₀.

The system 600 can also be modified to measure the scatteringdistribution (scattered light intensity as a function of angle) for theoptical body 630 when the optical body is immersed in air rather than inthe higher refractive index n_(h) of the hemisphere 610. This can bedone by removing the hemisphere 610 and the adhesive layer 620 so thatthe major surface of body 630 from which light is emitted is exposed toair rather than to the higher index medium of the layer 620 andhemisphere 610. In this way, the detector 650 detects and measures thelight scattering of the diffusive optical body 630 in a low-indexmedium, i.e., air.

Another way of characterizing the scattering or haze of an optical bodyis by measuring its “transport ratio” using a system similar to thatshown in FIG. 7. The transport ratio can also be used as a parameter todescribe the degree of semi-specularity of a given reflector, i.e., therelative amounts of specular reflection versus Lambertian reflection orscattering. FIG. 7 depicts an optical system 700 for measuringscattering or haze properties of a reflective optical body 730. Theoptical body 730 may for example be a semi-specular mirror constructionas shown in either of FIG. 4a or 4 b, or it may be another mirror filmor body whose scattering properties are unknown.

In system 700, a substantially collimated beam of light 745 is incidentat an angle θ_(inc), which is assumed to be 45 degrees unless otherwiseindicated to the contrary. The light 745 comprises wavelengths coveringthe wavelength range of interest, or a portion thereof. The light 745 isalso unpolarized unless otherwise indicated. An optical detector (notshown) detects light that is scattered by test sample 730, the detectorbeing capable of measuring the sum of all light scattered in forwarddirections 705 relative to an optical axis or surface normal 790, andalso capable of measuring the sum of all light scattered in backwarddirections 707 relative to the surface normal 790. The forward-scatteredflux, referred to here as “F”, and the backward-scattered flux, referredto as “B”, can be obtained by integrating the reflected intensities overthe quarter-sphere ranges of solid angles represented by the referencenumerals 705 and 707, respectively. Given the measured/calculated valuesF and B for a given sample, the transport ratio T of that sample isgiven by:T=(F−B)/(F+B).

A purely specular reflector will have no backscatter (B=0), and thusT=1. A purely Lambertian reflector will have an equal amount ofbackscatter and forward scatter (F=B), and thus T=0. Values between 0and 1 indicate a mix of specular and Lambertian reflection. In exemplaryembodiments, the semi-specular mirror constructions discussed herein(e.g. those depicted generally in FIGS. 4a and 4b ) exhibit a transportratio T of less than 80%, or less than 60%, or less than 40%, forexample. Such transport ratios can be provided in semi-specular mirrorfilms that have high hemispheric reflectivity (e.g. at least 97% when arear surface of the mirror film is in contact with an absorbingmaterial) and low loss, the MOF mirror film component of which may havea broad reflection band whose long wavelength band edge for normallyincident light is disposed at a wavelength that need not be greater than1600 nm, or 1400 nm, or 1200 nm, or 1000 nm.

Another significant property of the disclosed semi-specular mirror filmconstructions is their ability to have low absorption and transmissionlosses even when a back surface construction is in contact with anabsorbing material such as a black tape or paint. This may be stateddifferently by saying that the disclosed semi-specular mirror filmconstructions have a very high overall reflectivity or very highhemispheric reflectivity, e.g., at least 97%, even when the back surfaceof the construction is in contact with an absorbing material. Theoptical system 800 depicted generally in FIGS. 8a and 8b can be used tomeasure the hemispheric reflectivity. The system 800 includes a housing810 within which a low loss, high reflectivity integrating sphere 812 isplaced. The sphere may for example be coated on the inner surfacethereof with Spectralon™ (Labsphere, Inc., North Sutton, N.H.)reflective coating. The integrating sphere has three access holes orports cut therein in a mutually perpendicular orientation as shown: asample port 812 a, a light source port 812 b, and a detector port 812 c.A piece of the mirror construction under test is placed at the sampleport 812 a, preferably in such a way that the piece of mirrorsubstantially fills the hole or port. A light source 815, which emitslight at wavelengths covering the wavelength range of interest or aportion thereof, is placed at the port 812 b, and the light is reflectedwithin the integrating sphere 812 in all directions, and such light isincident on the mirror sample at port 812 a from all directions in air.A detector (not shown) is placed at the detector port 812 c.

The hemispheric reflectivity of the mirror sample is obtained bycomparing the detector output under two conditions: one in which themirror sample is present at the sample port 812 a, and one in which themirror sample has been removed and the port 812 a is open. Thedifference between these detector outputs can then be associated withthe hemispheric reflectivity of the sample. Before testing the sample,the system 800 can be calibrated with a sample of known reflectivity.

Note that the value of hemispheric reflectivity for a particular sampledoes not by itself provide an indication of whether the sample is adiffuse reflector, or a specular reflector, or a semi-specularreflector. Any one of a diffuse reflector, a specular reflector, or asemi-specular reflector may in general exhibit a very high, or very low,or intermediate value of hemispheric reflectivity. The disclosedsemi-specular reflectors, however, advantageously exhibit hemisphericreflectivities of at least 94% when the semi-specular reflector is basedon a conventional MOF mirror film having a high wavelength band edgenear 900-1000 nm, and at least 98% when the semi-specular reflector isbased on a broadband MOF mirror film having a high wavelength band edgenear 1600 nm, even when the back surface of the reflector is in contactwith an absorbing material. These high reflectivities are indicative ofvery low losses due to absorption and other factors, such losses beingless than 6% and 2%, respectively.

EXAMPLES Preparing Nanoporous Low Index Diffuse Coatings

Particles

Fumed silicon dioxide, (f-SiO₂) and fumed aluminum oxide (f-Al₂O₃)particles were obtained from Cabot Corporation, Billerica, Mass. TS-530™is a hydrophobic surface modified f-SiO₂ with a surface area of about225 m²/g. Spec-Al 100™ is f-Al₂O₃ with a surface area of approximately95 m²/g. These fumed metal oxide particles were obtained as dry powders.In order to improve the quality of mixing these particles into coatingformulations, the dry powders were first put into 10% solids premixeswith the desired solvent. Isopropyl alcohol or methyl ethyl ketone wereused interchangeably for TS 530, and water was used for Spec-Al 100. Drypowder was mixed in the solvent using a low shear air driven laboratorymixer, followed by a high shear air driven laboratory mixer equippedwith a 3-bladed paddle, until the particles were homogenously dispersed.

Cabo-Sperse PG 002™ and Cabo-Sperse 1020K™ (Cabot Corporation,Billerica, Mass.) are 20% solids dispersions of f-SiO₂ in water.

Polytetrafluoroethylene (PTFE) micropowder F300™ was obtained fromMicropowder Technologies of Tarrytown, N.Y. Sekisui-MBX-5™ (Sekisui-USA,New York, N.Y.) is crosslinked polymethylmethacrylate (PMMA) in the formof 5-8 micron beads. These two types of non-porous diffuser beads weredispersed using the same procedure as detailed above for the dry powdermetal oxides.

Binder Resins

Dyneon THV-220™ (Dyneon LLC, Oakdale, Minn.) is a fluorothermoplasticmade from tetrafluoroethylene, vinylidene fluoride andhexafluoropropylene monomers. Dyneon FC 2145™ (Dyneon LLC, Oakdale,Minn.) is a fluoroelastomer made from vinylidene fluoride andhexafluoropropylene monomers. For use in preparing coating mixtures,THV-200 pellets were first dissolved to 12% solids in a mixture of 97%methyl ethyl ketone and 3% butyl acetate. FC 2145 in gum form waslikewise dissolved to 10% solids in methanol. Polyvinyl alcohol PVA-235™(Kuraray-USA, Houston, Tex.) was dissolved to 7% solids in water at80-90 C with stirring. PMMA V0-44™ (Rohm and Haas C., a wholly owneddivision of Dow Chemical Co., Midland, Mich.) is amethylmethacrylate-ethylacrylate copolymer.

Ebecryl 8807™ (Cytec Industries, Inc., Smyrna, Ga.) is a polyurethaneacrylate macromer (PUA). Coatings containing PUA were cured withultraviolet radiation, using 1% Esacure KB-1™ (Lamberti S.p.A.,Gallarate, Italy) as the photoinitiator. A Light Hammer 6™ (Fusion UVSystems, Inc., Gaithersburg, Md.) system was used, employing a 500 WattH-bulb at 100% power. The UV cure chamber was purged with dry nitrogen.Coated films were exposed to the UV light at 40 fpm for 2 passes.

SPU-5K is a silicone polyurea formed from the reaction betweenalpha,omega-aminopropyl polydimethyl siloxane and m-tetramethyl xylenediisocyanate, as described in U.S. Pat. No. 6,355,759 (Sherman, et al.),Example #23.

Coating Process for Hand-Spreads

Small laboratory scale hand spread coatings of good optical quality wereprepared by coating a low index coating solution on a film substrate.The film was held flat using a level 14×11 in. (35.6 cm by 27.9 cm)vacuum table model 4900™ (Elcometer Inc., Rochester Hills, Mich.).Coating solution was spread evenly on PET film using a wire woundcoating rod or “Meyer rod” (RD Specialties, Webster, N.Y.) or, forthinner coatings, by use of a knife bar available from Elcometer, Inc.,Rochester Hills, Mich. A standard sheet of white paper (8.5×11 in) wasplaced between the vacuum table and optical film to prevent coatingdefects associated with the vacuum table. Each coating was made using adegassed solution to avoid optical defects such as air bubbles andsurface cracks. A 5-8 ml sample of the coating solution was placed nearthe top of the film and the coating was spread using either a number 45or a number 30 Meyer rod which provided a coating with a nominal wetthickness of 4.5 or 3.0 mils (114 or 76.2 microns), respectively. When aknife bar was used, a 2 to 4 mil (50.8-101.6 microns) knife bar gapprovided a coating with a nominal wet thickness of 1 to 2 mils (25.4 to50.8 microns) respectively. Each wet coating was allowed to air dry atroom temp for about 2-3 minutes and the specimen was then carefullytransferred to a flat glass plate and put in a forced air oven set at 50C, to dry completely. The coatings were covered with an appropriatelysized inverted aluminum pan to reduce drying patterns on the film due toair movement in the oven.

The process was modified for UV cured coated articles in Examples 4-6.After coating, the samples were dried briefly at room temperaturefollowed by complete drying at 85 C for 2 min. The coatings were thencured using the procedures described above.

Coating Process for Automated Coating

The coater utilized a slot die with the film substrate supported againsta back-up roll. The gap between the slot die and backup roll wasadjusted to accommodate the film and to produce a stable coating acrossthe film. A 2.93 cc/rev Zenith™ gear pump (Zenith Pumps, Monroe, N.C.)was used to pump coating solution through a 30 micron filter (RokiTechno Co, Ltd., Tokyo, Japan) and into the slot die. When an MOF mirrorfilm was to be coated, it was first exposed to a 750 mJ/cm² coronadischarge in a nitrogen atmosphere. When a primed PET film was to becoated, no additional surface preparation was needed. After the coatingwas applied, film was dried in an impingement oven at 80 C with an airvelocity of 20 m/s and a residence time of about one minute. Coatingspeed was 15 ft/min (4.57 m/min) unless otherwise noted and the coatingwidth was 10 in. (25.4 cm).

Substrate Films

For some of the optical measurements, 2 mil (50 micron) primed PET film689™ (DuPont—Teijin Films USA, Chester, Va.) was used. Exemplarysemi-specular mirror films were prepared using broadband mirror filmsubstrates similar to 3M Vikuiti Enhanced Specular Reflector (ESR)™ (3M,St. Paul, Minn.). The commercial film has a long wavelength band edgedisposed in a region from about 900-1000 nm (for normally incidentlight). By modifying the manufacturing procedure in ways known in theart, i.e., by modifying the optical packet or optical stack structure(layer thickness profile) through such methods as those described inU.S. Pat. No. 6,783,349 (Neavin et al.), by changing the number ofpackets or stacks, and/or by changing the total number of layers, filmshaving high wavelength band edges extended to 1200 nm, 1400 nm, and 1600nm were prepared.

Refractive Index, Optical Transmission, Haze and Clarity Measurements

These optical measurements were obtained on exemplary coatings made onPET film substrates, since the mirror film substrates are highlyreflective and thus, not transmissive.

Refractive index (RI) values were determined by use of the prismcoupling method using a Metricon 2010M™ Prism Coupler (Metricon Corp.,Pennington, N.J.). The RI(n) was determined at 633 nm. Accuratedetermination of the refractive index of the higher haze coatings wasbest determined by measuring the refractive index in the TM polarizationstate through the PET side of the coated film. In this procedure, theprism and the PET side of the coated films were coupled and the RImeasurement was scanned from n=1.55 to n=1.05. This method resulted inthe detection of two critical angle transitions; one associated with thePET-prism interface at approximately n=1.495 and another associated withthe PET-low index coating interface. Because this second transition wasoften not sharp, the Metricon raw data were analyzed to determine thecritical angle of this second transition by use of a 200 point smoothinganalysis program, applied to the regions above and below the inflectionpoint of this second critical angle. Two linear regions were determinedfrom the smoothed data and the intersection of these two linescorresponded to the inflection point of the curve and thus the RI, or aneffective RI, of the low refractive index coating.

Transmission, haze, and clarity values were determined using aBYK-Gardner Haze Gard Plus™ (BYK-Gardner USA, Columbia, Md.). Thereported values represent the average of at least 3 measurements takenfrom different regions on the coated film.

Hemispherical Reflectivity (% R) Measurements

Hemispherical reflectivity was measured using an integrating spheremethod. The apparatus is shown in FIG. 8a and FIG. 8b , and has beendescribed above. The hemispherical reflectivity is the totalreflectivity of the sample, i.e., the reflectivity integrated over allangles of incidence.

The integrating sphere was set up so that the test specimen was notdirectly imaged at any time. The incoming light impinged on the sphereand was diffusely reflected. The reflected light then impinged on thesample at all incidence angles. The intensity as a function ofwavelength was measured at the sample port using a ProMetric PR650™camera (Radiant Imaging, Inc., Redmond, Wash.).

Two measurements were taken for each test, and used to compute thereflectivity. The intensity was first measured with the test specimen onthe sample port, then the specimen was removed and the intensity wasmeasured with the port open. The ratio of these intensities is thecavity gain. The gain equation was then solved for the samplereflectivity for each wavelength. The gain equation is:

${g(\lambda)} = \frac{1}{1 - {{R_{sample}(\lambda)}*{R_{cavity}(\lambda)}}}$

where g is the cavity gain, R_(sample) is the reflectivity of thespecimen, R_(cavity) is the reflectivity of the cavity, and λ is thewavelength of light. The cavity reflectivity was obtained by measuring astandard of known reflectivity first and then solving the gain equationfor the cavity reflectivity. A Spectralon Reference Target SRT-99-050™(Labsphere, Inc., Sutton, N.H.) was used.

To calculate % R Loss, two measurements were made. First thereflectivity of the diffuse reflector film was recorded. Then thereflectivity of the diffuse reflector film was recorded with anabsorbing material (black vinyl tape) laminated to the back side of thefilm. The absorbing material allows light that is not reflected by theoptical stack and that would normally be reflected by total internalreflection to escape and, hence, the difference in reflectivity betweenthe first and second measurements is a measure of the amount of lightleaking through the optical stack. Therefore it is desirable to have the% R loss value be as low as possible.

Light Transport Ratio (Tr) Measurements

Transport Ratio was measured using an apparatus shown schematically inFIG. 7 and described above. The transport ratio in essence describes thedegree of specularity or semi-specularity of a given reflector or othercomponent. A thorough description of transport ratio and its use in thedesign of optical systems is given in published applicationWO2008/144644.

The degree of semi-specularity or transport ratio Tr can be described bythe following equation:Tr=(R _(F) −R _(B))/(R _(F) +R _(B))

R_(F)=flux of the forward scattering light components

R_(B)=flux of the backward scattering light components

where Tr can range from −1 (R_(F)=0, Retroreflective) to 0 (R_(F)=R_(B)Lambertian) to 1 (R_(B)=0 purely specular). R_(F) and R_(B) can beobtained from the integrated reflection intensities over all solidangles. The case where Tr is less than zero, (R_(B)>R_(F)), the filmconstruction is considered to be retroreflective in that more light isdirected back to light source than is reflected forward.

The Tr for any real reflective or transmissive component is a functionof the incidence angle of the light. For purposes of this application,unless otherwise specified, Tr is determined at an angle of incidence(aoi) of 45 degrees.

To measure transport ratio, a ConoScope™ (Autronic-Melchers, Karlsruhe,Germany) with optional reflection mode was used. To measure Tr, aspecimen was illuminated at the specified angle of incidence (45degrees) and then the reflected light was measured by the ConoScopeusing a 2 mm aperture. The Autronic software was used to calculate Trfrom this data using the formula above.

Example 1

50 g of methanol and 15 g of TS 530 were charged to a 400 ml plasticlaboratory beaker equipped with an air driven 3-blade paddle stirrer.The TS 530 powder was added to the stirred methanol in small portions toaid in dispersion. The agitator was at first run slowly until theparticles were wetted by the solvent. The mixture became very viscousand about 50 g of additional methanol was added slowly. It was necessaryto use a wooden spatula to repeatedly push the particles that adhered tothe side of the flask back into the mixture. Once all the particles wereimmersed in the solvent, the agitation rate was increased and anadditional small amount of methanol was added. The solids content of thefinal mixture was found to be 14%. During storage, the particle mixturewas placed on a standard laboratory shaker set at low speed to ensurethe particles did not settle out of the mixture. Using the same mixingapparatus, 30 g of 10% FC 2145 in methanol was charged to a 200 mlplastic beaker and the mixer was set to a slow speed. 64 g of the TS 530methanol mixture (which, at 14% solids, corresponded to 9 g of TS 530solids) was added to the polymer solution. This addition greatlyincreased the viscosity of the mixture and the agitation rate wasincreased to ensure complete mixing. After the components werethoroughly mixed, the final mixture was transferred to a brown glassbottle, sealed and placed on a laboratory mixer to prevent settling ofthe particles from the mixture.

The coating mixture was coated on the broadband mirror film substratedescribed above having a bandwidth of 400 nm to 1600 nm. The Hand-spreadcoating process described above was used.

Examples 2-6

Examples 2-6 were prepared in the same manner as Example 1 but thesolvent and resins were changed as shown in Table 1.

Examples 7-8

The coating mixtures used to prepare the specimens of Examples 7 and 8were prepared from mixtures of PVA-235 and the fumed silicon oxidedispersion Cab-O-Sperse PG002™. Poly Cup 172™ (PC 172) was used as thecrosslinker in the formulation. PC 172 is a polyamide-epichlorohydrinpolymer available as a 12% solids solution in water from Hercules Corp.of Newark, Del. 100 g of deionized water, 0.5 ml of ammonium hydroxide(30 wt %) and 2.0 g of PC 172 (2.5 wt % based on PVA content) were addedto an 800 ml plastic beaker and mixed thoroughly with a stirring rod.300 g of Cab-O-Sperse PG002 fumed silicon oxide dispersion (20 wt % inwater) and 2.0 g of surfactant Tergitol Min-Foam 1X™ (Dow Chemical ofMidland, Mich.) (10 wt % in water) were then added. Once these were wellmixed, 138.8 g of 7.2 wt % PVA 235 solution and another 160 g ofdeionized water were added to the mixture followed by additional mixingwith a stirring rod. The coating mixture was transferred to a 1 L,1-neck round bottom flask and placed on a Rotovap at 40 C and 600 mm Hgvacuum to degas the mixture. The final solids content of the mixture wasadjusted to 10% wt. The final mixture on a dry weight basis had 1 partPVA resin to 6 parts silica (14.3% PVA by weight). The same substrateand coating process were used as for Example 1.

TABLE 1 Tr and % R Loss Values for Nanoporous Low Index Coatings on WideBand Mirror Film Wt % and Resin Wt % and Particle Wet % R Example TypeType Solvent Thickness Tr (45°) Loss 1 25% FC 2145 75% TS 530 Methanol1.5 mil 0.44 0.86 2 25% SPU-5K 75% TS 530 Isopropyl 1.5 mil 0.24 0.91Alcohol 3 25% PMMA 75% TS 530 Ethyl acetate 1.5 mil 0.49 0.75 4 25% PUA75% TS 530 Isopropyl 0.7 mil 0.98 1.06 Alcohol 5 25% PUA 75% TS 530Isopropyl 1.5 mil 0.49 0.92 Alcohol 6 25% PUA 75% TS 530 Isopropyl 3.0mil 0.23 0.88 Alcohol 7 14.3% PVA 85.7% PG002 Water 1.2 mil 0.97 0.57 814.3% PVA 85.7% PG002 Water 3.0 mil 0.73 0.56

Examples 9-11

The coating mixtures used to prepare the specimens of Examples 9-11 wereprepared using the same procedures as Examples 7-8, but the batch sizewas increased to 3000 g and the crosslinker PC 172 was replaced by theaziridine CX100™ (DSM, Wilmington, Del.). CX 100 was added at 5 wt %based on PVA solids. A laboratory air driven mixer was used tofacilitate the mixing process. Several different substrate films, havingdifferent bandwidths, were used, as is shown in Table 2. All specimenswere coated using the Automated Coating procedure detailed previously,and the coating mixture was adjusted to 15 wt % solids.

Comparative Examples C1-C4

Comparative Example C1 were prepared using the low refractive indexresin THV 220 and the non-porous diffuser particles PTFE MicropowderF300. The particles (or “beads”) and resins were mixed using the sameprocedure as was used for Examples 1-6, but the PTFE bead loading andresin loading were adjusted to those shown in Table 2, and the batchsize was scaled up to 3000 g. Comparative Examples C2-C4, were preparedidentically, except that 10 wt % of the PTFE F-300 was replaced by SpecAl 100™, to improve the light scattering effects of the coatings. Theoverall resin to bead ratio was held constant for these comparativeexamples.

TABLE 2 Influence on Band Width on Tr and % R Loss Wet Coating Wt % andWt % and Film Weight % R Example Resin Type Particle Type BandwidthSolvent (g/min) Tr (45°) Loss  9 14.3% PVA 85.7% PG002 400-1600 nm Water50 0.60 0.50 10 14.3% PVA 85.7% PG002 400-1400 nm Water 50 0.84 0.30 1114.3% PVA 85.7% PG002 400-1200 nm Water 30 0.83 0.20 C1 33% THV 67% PTFE400-1600 nm MEK 57 0.61 1.5 C2 33% THV 60% PTFE 400-1600 nm MEK 43 0.52.53 7% Al2O3 C3 33% THV 60% PTFE 400-1400 nm MEK 40 0.35 3.3 7% Al2O3C4 33% THV 60% PTFE 400-1200 nm MEK 40 0.41 4.9 7% Al2O3

The optical data shows that the Exemplary nanoporous coatings on themirror films have very low % R loss compared to the Comparative diffusercoatings.

Examples 12-15

The coating mixtures used to prepare the specimens of Examples 12-13contained PVA-235 and fumed silicon oxide dispersion Cab-O-Sperse1020K™. 138.8 g of 7.2 wt % PVA 235 solution (10.0 g PVA 235 on a dryweight basis) was charged to an 800 ml plastic beaker followed by theaddition of 2.0 g of 10 wt % Tergitol Min-Foam 1X™ and 1 ml ofconcentrated ammonium hydroxide solution. These components were mixedthoroughly with a stirring rod. 300 g of Cab-O-Sperse 1020K™, at 20 wt %in water, was added, followed by the addition of 260 g of deionizedwater. After thorough mixing, the contents were transferred to a 1 L,1-neck round bottom flask and placed on a Rotovap at 40 C and 600 mm Hgvacuum to degas the mixture. The final solids were adjusted to 10% wt.The final mixture on a dry weight basis had 1 part PVA resin to 6 partssilica (14.3% PVA by weight).

The coating mixtures used to prepare the specimens of Examples 14-15were prepared in the same manner, except the resin to silica ratio wasadjusted to 1:4 (20 wt % PVA). The coating mixtures were applied usingthe Automated Coating procedure described above. The coatings wereapplied at coating weights of 30 and 50 ml/min to broadband mirror filmhaving a bandwidth of 400-1600 nm. Optical properties are summarized inTable 3.

Comparative Examples C5-C6

Fluoropolymer tandem coating mixtures were used to prepare comparativesemi-specular bilayer coatings. The first layer was a 2.7-3 micronthick, low haze, low refractive index THV layer (THV 200, n=1.36). Thesecond layer (top layer) was a common bulk diffuser composition Thebottom THV low index layer was coated from a 12% MEK/BA solution (asdescribed previously) onto mirror film having a bandwidth of 400-1600nm. The THV coating solution was applied using the Automated Coatingprocedure described above at a flow rate of 132 ml/min. The samesubstrate film was used as in Ex. 12-15. The broadband mirror filmcoated with this THV layer became the input film for the non porousdiffuser layer containing polyvinyl butyral (PVB), SR454™, andSekisui-MBX-5™ diffuser beads. Butvar 74™ (PVB-74) is available fromSolutia Inc. St. Louis Mo. This polymer was dissolved at 10% solids in93/7 isopropyl alcohol/acetone before addition of the diffuser beads.SR454™ is methoxylated trimetholpropane triacrylate available fromSartomer Corp., Exton, Pa. The final diffuser coating mixture compriseda 33/67 wt % blend of (PVB-74+SR 454) and PMMA beads at 14 wt % solidsin 93/7 IPA/acetone solvent blend. The resin mixture of the PVB-74+SR454 comprised 55 wt % PVB-74 and 45 wt % SR 454. In order to ensurecomplete bead dispersion, the coating mixture was mixed at high shearusing a PreMax™ single stage roto-stator mixer (Charles Ross & Son Co.,Hauppauge, N.Y.) operating at 4000 rpm for 5 minutes. The coatingsolution was applied to the THV layer using the Automated Coatingprocedure at flow rates of 30 and 50 ml/min to produce the twoComparative Examples with dry coating thicknesses of 6 and 8 microns.The dried coating was UV cured by exposure to a 600W H-bulb using 0.5 wt% Esacure KB-1™ as the photo initiator based on SR 454 content. Theoptical properties are summarized in Table 3.

TABLE 3 Single Layer Nanoporous Diffuse Low Index Coatings Compared toBi-layer Tandem Diffuse Coatings Wet Coating Wt % and Wt % and Weight Wt% Tr % R Example Resin Type Particle Type Solvent (ml/min) Solids (45°)Loss 12 14.3% PVA 85.7% 1020K Water 30 10% 0.96 0.6 13 14.3% PVA 85.7%1020K Water 50 10% 0.69 0.8 14 20% PVA 80% 1020K Water 25 10% 0.64 0.815 20% PVA 80% 1020K Water 50 10% 0.18 0.6 C5 33 wt % 67% PMMA 97/3Isopropyl 22 17% 0.86 1.0 PVB/SR454 MBX-5 alcohol/ Acetone C6 33 wt %67% PMMA 97/3 Isopropyl 40 17% 0.45 1.1 PVB/SR454 MBX-5 alcohol/ Acetone

Examples 16-18

The coating mixtures used to prepare the specimens of Examples 16 and 17were the same as described for Examples 12 and 13, respectively. Thecoating mixture used to prepare the specimens of Example 18 was preparedusing the same procedures as Example 12 except that the resin to silicaratio was adjusted to 1:3 (25 wt % PVA). The coatings were made usingthe hand spread technique, at both 4 and 8 mils wet thickness, usingcoating mixtures adjusted to 10 wt % solids. The coatings were appliedto PET film, so that optical properties of the coatings which requiretransparent (non-mirror) specimens could be measured. Optical propertieswere measured as described previously. The results are shown, for the 8mil wet thickness specimens, in Table 4.

TABLE 4 Coating Optical Properties on Transparent PET Film Example Wt %and Resin Type Wt % and Particle Type Transmission Haze Clarity RI (n)16 14.3% PVA 85.7% 1020K 64% 100% 2% 1.164 17 20.0% PVA 80.0% 1020K 55%100% 8% 1.191 18 25.0% PVA 75.0% 1020K 47% 100% 12%  1.204

FIG. 9b shows the results of additional optical testing on the specimensof Examples 16-18. The scattering intensity is plotted as a function ofthe angle, measured from the normal. The apparatus shown in FIG. 6(described previously) was used to generate the curves. Curve 918relates to Example 16, coated at 4 mils wet thickness. Curve 922 relatesto Example 16, coated at 8 mils wet thickness. Curve 914 relates toExample 17, coated at 4 mils wet thickness. Curve 916 relates to Example17, coated at 8 mils wet thickness. Curve 912 relates to Example 18,coated at 4 mils wet thickness. Curve 920 relates to Example 18, coatedat 8 mils wet thickness.

The small peak in curve 916 at zero angle is related to the optical“punch through” phenomenon, and has been removed from the other curvesfor clarity. It can be seen that each curve exhibits a characteristicsemi-specular “signature”—Significant scattering intensity out to about+/−45 degrees, little or no scattering intensity at higher angles, and atendency for the scattering intensity to be flattened across asignificant range, from −25 degrees to +25 degrees.

Examples 19-21

In these Examples, 3-Layer semi-specular mirrors comprising a nanoporouslow haze low index coating layer and a non-porous diffuser coating layerwere made. A broadband mirror film substrate was coated with the samecoating mixture used in Example 9. This mixture was coated onto thebroadband film using the Automated Coating procedure described above ata pump rate of 50 g/min to produce a porous low refractive index coatingwith a dry thickness of approximately 8 microns. The diffuser coatingsolution used to prepare Comparative Examples C4 and C5 was then coatedon this once-coated film at three different coating weights, and cured,to produce the coated semi-specular coatings of Examples 19-21. Opticalproperties are shown in Table 5. Results from Example 9 are included forcomparison.

Comparative Example C7

Comparative Example C7 was prepared exactly as Example 21, except thatthe broadband mirror film was not first coated with a nanoporous lowhaze low index layer. The non-porous diffuser coating layer was applieddirectly to the substrate film. Optical properties are shown in Table 5.

TABLE 5 3-Layer semi-specular mirrors comprising a nanoporous low hazelow index coating layer and a non-porous diffuser coating layer DiffuserWet Coating Wt % and Wt % and Weight Example Resin Type Particle TypeDiffuser (g/min) Tr (45°) % R Loss  9 14.3% PVA 85.7% PG002 none 0 0.600.50 19 14.3% PVA 85.7% PG002 PVA/SR454 PMMA 35 0.25 0.7 20 14.3% PVA85.7% PG002 PVA/SR454 PMMA 25 0.10 0.6 21 14.3% PVA 85.7% PG002PVA/SR454 PMMA 20 0.094 0.7 C7 none none PVA/SR454 PMMA 20 0.92 4.8

The Film of Comparative Example C7 was also tested for scatteringintensity as a function of angle, by procedures identical to those ofEx. 16-18. The results are shown as curve 910 in FIG. 9a . In comparisonto all the curves in FIG. 9b , it can be seen that the C7 film is muchcloser to a Lambertian scatterer, exhibiting significant scatteringintensity out to much higher angles of +1-75 degrees, and it thus not aseffective as a semi-specular mirror.

Unless otherwise indicated, all numbers expressing quantities,measurement of properties, and so forth used in the specification andclaims are to be understood as being modified by the term “about”.Accordingly, unless indicated to the contrary, the numerical parametersset forth in the specification and claims are approximations that canvary depending on the desired properties sought to be obtained by thoseskilled in the art utilizing the teachings of the present application.Not as an attempt to limit the application of the doctrine ofequivalents to the scope of the claims, each numerical parameter shouldat least be construed in light of the number of reported significantdigits and by applying ordinary rounding techniques. Notwithstandingthat the numerical ranges and parameters setting forth the broad scopeof the invention are approximations, to the extent any numerical valuesare set forth in specific examples described herein, they are reportedas precisely as reasonably possible. Any numerical value, however, maywell contain errors associated with testing or measurement limitations.

Various modifications and alterations of this invention will be apparentto those skilled in the art without departing from the spirit and scopeof this invention, and it should be understood that this invention isnot limited to the illustrative embodiments set forth herein. Forexample, the reader should assume that features of one disclosedembodiment can also be applied to all other disclosed embodiments unlessotherwise indicated. It should also be understood that all U.S. patents,patent application publications, and other patent and non-patentdocuments referred to herein are incorporated by reference, to theextent they do not contradict the foregoing disclosure.

The invention claimed is:
 1. A reflective film, comprising: a multilayeroptical film having a first major surface and a second major surface,wherein the multilayer optical film includes a plurality of microlayersconfigured to provide a broad reflection band that shifts as a functionof incidence angle, the multilayer optical film having a long wavelengthband edge disposed at a wavelength no greater than 1600 nm for normallyincident light; and a diffusing layer in contact with the first majorsurface, the diffusing layer adapted to scatter visible light into themultilayer optical film over a range of angles such that the scatteredlight can be substantially reflected by the broad reflection band;wherein the diffusing layer comprises a polymer binder having ananovoided morphology comprising a plurality of interconnected voids ora network of voids dispersed in the polymer binder; and wherein thereflective film has a total hemispheric reflectivity for visible lightof at least 97% when the second major surface of the multilayer opticalfilm is in contact with an absorbing material.
 2. The reflective film ofclaim 1, wherein the broad reflection band has, for normally incidentlight, a long wavelength band edge disposed at a wavelength no greaterthan 1000 nm, wherein the reflective film provides visible lightscattering corresponding to a transport ratio of less than 80%.
 3. Thereflective film of claim 2, wherein the transport ratio is less than80%.
 4. The reflective film of claim 2, wherein the transport ratio isless than 40%.
 5. The reflective film of claim 1, wherein the diffusinglayer has a void volume fraction of at least 30%.
 6. The reflective filmof claim 1, wherein the diffusing layer also comprises a plurality ofparticles.
 7. The reflective film of claim 6, wherein the particlescomprise silicon dioxide or alumina oxide.
 8. The reflective film ofclaim 6, wherein the plurality of particles has a size distribution thatincludes particles with a size not greater than 1 micrometer, andaggregates of the particles.
 9. The reflective film of claim 6, whereina weight percent of particles in the diffusing layer is at least 50%.10. The reflective film of claim 6, wherein the weight percent ofparticles in the diffusing layer is at least 66%.
 11. The reflectivefilm of claim 6, wherein the weight percent of particles in thediffusing layer is at least 75%.
 12. The reflective film of claim 6,wherein the weight percent of particles in the diffusing layer is atleast 80%.
 13. The reflective film of claim 1, wherein the diffusinglayer has a scattering distribution into a substrate of refractive indexns when illuminated by a normally incident beam of visible light,wherein ns is a minimum refractive index of the plurality ofmicrolayers, and wherein the scattering distribution is substantiallyreduced at grazing angles in the substrate.
 14. The reflective film ofclaim 1, wherein the diffusing layer has a scattering distribution intoa substrate of refractive index ns when illuminated by a normallyincident beam of visible light, wherein ns is a minimum refractive indexof the plurality of microlayers, and wherein the scattering distributionhas a value S0 at a scattering angle of 0 degrees and a value S60 at ascattering angle of 60 degrees, and wherein S60 is less than 10% of S0,and wherein the scattering angle is the deviation angle within thesubstrate relative to the normally incident beam.
 15. The reflectivefilm of claim 14, wherein the scattering distribution has a value S70 ata scattering angle of 70 degrees, and wherein S70 is also less than 10%of S0.
 16. The reflective film of claim 14, wherein the scatteringdistribution has a value S50 at a scattering angle of 50 degrees, andwherein S50 is also less than 10% of S0.